Microscopic analyses on Zr adsorbed IDA chelating resin by PIXE and EXAFS

Yoichi Arai, Sou Watanabe, Shimpei Ohno, Kazunori Nomura, Fumiya Nakamura, Tsuyoshi Arai, Noriaki Seko, Hiroyuki Hoshina, Naoto Hagura, Toshio Kubota

Research output: Contribution to journalArticle

Abstract

Radioactive spent solvent waste containing U and Pu is generated from reprocessing process of spent nuclear fuel. The nuclear materials removal is important for safety storage or disposal. Imino diacetic acid (IDA) type chelating resin is promising adsorbent, and its characterization is performed by Particle Induced X-ray Emission (PIXE) and Extended X-ray Absorption Fine Structure (EXAFS) analyses on Zr in order to evaluate adsorption mechanism. PIXE succeeded in quantitative analysis on few microgram of adsorbed Zr, and EXAFS suggested that Zr in the aqueous solution and in the solvent can be trapped by IDA group with different mechanisms.

Original languageEnglish
Pages (from-to)54-59
Number of pages6
JournalNuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms
Volume477
DOIs
Publication statusPublished - 2020 Aug 15

Keywords

  • Chelating resin
  • EXAFS
  • Micro-PIXE
  • Spent solvent
  • Zr recovery

ASJC Scopus subject areas

  • Nuclear and High Energy Physics
  • Instrumentation

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