Microstructure and elasticity of glassy alloy surface by reactive and inert ion implantation

Shinji Muraishi, Hirono Naito, Tatuhiko Aizawa

Research output: Contribution to journalArticle

1 Citation (Scopus)

Abstract

Present work focuses on the structural change of Zr-Cu glassy film via penetration of different reactivity of N+ and Ar+ and its elasticity measurement. Amorphous Zr-30at%Cu film has been synthesized by ion beam sputtering on Si substrate. Nitrogen implantation induced precipitation microstructure with (Zr-Cu) nitride and Cu phase in glassy matrix. Inert gas element of Ar+ makes voids structure inside of the film at the mean penetration depth of Ar+ as maintained glassy phase. Resultant microstructures due to penetrated ions strongly depend on their degree of chemical reactivity with constituents. Surface elasticity of modified structure have been evaluated from nano-indentation test and given the normalization treatment for measured Young's modulus.

Original languageEnglish
Pages (from-to)1859-1863
Number of pages5
JournalMaterials Transactions
Volume48
Issue number7
DOIs
Publication statusPublished - 2007 Jul
Externally publishedYes

Fingerprint

Ion implantation
ion implantation
Elasticity
elastic properties
microstructure
Microstructure
penetration
reactivity
Noble Gases
Chemical reactivity
Nanoindentation
Inert gases
nanoindentation
Nitrides
Chemical elements
Ion beams
nitrides
Sputtering
voids
rare gases

Keywords

  • Ion implantation
  • Metallic glass
  • Nano indenter
  • Transmission electron microscope
  • Zirconium nitride

ASJC Scopus subject areas

  • Materials Science(all)
  • Metals and Alloys

Cite this

Microstructure and elasticity of glassy alloy surface by reactive and inert ion implantation. / Muraishi, Shinji; Naito, Hirono; Aizawa, Tatuhiko.

In: Materials Transactions, Vol. 48, No. 7, 07.2007, p. 1859-1863.

Research output: Contribution to journalArticle

Muraishi, Shinji ; Naito, Hirono ; Aizawa, Tatuhiko. / Microstructure and elasticity of glassy alloy surface by reactive and inert ion implantation. In: Materials Transactions. 2007 ; Vol. 48, No. 7. pp. 1859-1863.
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