MOCVD-TiN barrirer for blanket W-CVD

K.Ohto K.Ohto, K.Ueno K.Ueno, K.Tsunenari K.Tsunenari, K.Numajiri K.Numajiri, M.Okamura M.Okamura, H.Jinba H.Jinba, Kazuyoshi Ueno

Research output: Contribution to journalArticle

Original languageEnglish
Pages (from-to)151-157
JournalAdvanced Metallization for ULSI Applications in 1993
Publication statusPublished - 1993 Oct 1

Cite this

K.Ohto, K. O., K.Ueno, K. U., K.Tsunenari, K. T., K.Numajiri, K. N., M.Okamura, M. O., H.Jinba, H. J., & Ueno, K. (1993). MOCVD-TiN barrirer for blanket W-CVD. Advanced Metallization for ULSI Applications in 1993, 151-157.

MOCVD-TiN barrirer for blanket W-CVD. / K.Ohto, K.Ohto; K.Ueno, K.Ueno; K.Tsunenari, K.Tsunenari; K.Numajiri, K.Numajiri; M.Okamura, M.Okamura; H.Jinba, H.Jinba; Ueno, Kazuyoshi.

In: Advanced Metallization for ULSI Applications in 1993, 01.10.1993, p. 151-157.

Research output: Contribution to journalArticle

K.Ohto, KO, K.Ueno, KU, K.Tsunenari, KT, K.Numajiri, KN, M.Okamura, MO, H.Jinba, HJ & Ueno, K 1993, 'MOCVD-TiN barrirer for blanket W-CVD', Advanced Metallization for ULSI Applications in 1993, pp. 151-157.
K.Ohto KO, K.Ueno KU, K.Tsunenari KT, K.Numajiri KN, M.Okamura MO, H.Jinba HJ et al. MOCVD-TiN barrirer for blanket W-CVD. Advanced Metallization for ULSI Applications in 1993. 1993 Oct 1;151-157.
K.Ohto, K.Ohto ; K.Ueno, K.Ueno ; K.Tsunenari, K.Tsunenari ; K.Numajiri, K.Numajiri ; M.Okamura, M.Okamura ; H.Jinba, H.Jinba ; Ueno, Kazuyoshi. / MOCVD-TiN barrirer for blanket W-CVD. In: Advanced Metallization for ULSI Applications in 1993. 1993 ; pp. 151-157.
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author = "K.Ohto K.Ohto and K.Ueno K.Ueno and K.Tsunenari K.Tsunenari and K.Numajiri K.Numajiri and M.Okamura M.Okamura and H.Jinba H.Jinba and Kazuyoshi Ueno",
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AU - K.Ueno, K.Ueno

AU - K.Tsunenari, K.Tsunenari

AU - K.Numajiri, K.Numajiri

AU - M.Okamura, M.Okamura

AU - H.Jinba, H.Jinba

AU - Ueno, Kazuyoshi

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JO - Advanced Metallization for ULSI Applications in 1993

JF - Advanced Metallization for ULSI Applications in 1993

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