Moisture-absorption-induced permittivity deterioration and surface roughness enhancement of lanthanum oxide films on silicon

Yi Zhao; Masahiro Toyama; Koji Kita; Kentaro Kyuno; Akira Toriumi

doi:10.1063/1.2174840

Moisture-absorption-induced permittivity deterioration and surface roughness enhancement of lanthanum oxide films on silicon

Yi Zhao, Masahiro Toyama, Koji Kita, Kentaro Kyuno, Akira Toriumi

Research output: Contribution to journal › Article › peer-review

189 Citations (Scopus)

Abstract

Effects of moisture absorption on permittivity and surface roughness of lanthanum oxide (La2 O3) films were investigated. It was found that the moisture absorption deteriorates the permittivity (k) of La2 O3 films on silicon because of the formation of hexagonal La (OH)3 with a low permittivity after films were exposed to the air. Therefore, the moisture absorption should be a very possible reason for the permittivity variation of La2 O3 film in literatures reported, so far. Furthermore, a roughness enhancement was also observed after La2 O3 films were exposed to the air for several hours. This observation should be another concern of hygroscopic La2 O3 film application.

Original language	English
Article number	072904
Journal	Applied Physics Letters
Volume	88
Issue number	7
DOIs	https://doi.org/10.1063/1.2174840
Publication status	Published - 2006
Externally published	Yes

ASJC Scopus subject areas

Physics and Astronomy (miscellaneous)

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title = "Moisture-absorption-induced permittivity deterioration and surface roughness enhancement of lanthanum oxide films on silicon",

abstract = "Effects of moisture absorption on permittivity and surface roughness of lanthanum oxide (La2 O3) films were investigated. It was found that the moisture absorption deteriorates the permittivity (k) of La2 O3 films on silicon because of the formation of hexagonal La (OH)3 with a low permittivity after films were exposed to the air. Therefore, the moisture absorption should be a very possible reason for the permittivity variation of La2 O3 film in literatures reported, so far. Furthermore, a roughness enhancement was also observed after La2 O3 films were exposed to the air for several hours. This observation should be another concern of hygroscopic La2 O3 film application.",

author = "Yi Zhao and Masahiro Toyama and Koji Kita and Kentaro Kyuno and Akira Toriumi",

note = "Funding Information: This work was partly supported by a Grant-in-Aid for Scientific Research from the Ministry of Education, Culture, Sports, Science, and Technology in Japan, and NEDO/MIRAI project.",

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T1 - Moisture-absorption-induced permittivity deterioration and surface roughness enhancement of lanthanum oxide films on silicon

AU - Zhao, Yi

AU - Toyama, Masahiro

AU - Kita, Koji

AU - Kyuno, Kentaro

AU - Toriumi, Akira

N1 - Funding Information: This work was partly supported by a Grant-in-Aid for Scientific Research from the Ministry of Education, Culture, Sports, Science, and Technology in Japan, and NEDO/MIRAI project.

PY - 2006

Y1 - 2006

N2 - Effects of moisture absorption on permittivity and surface roughness of lanthanum oxide (La2 O3) films were investigated. It was found that the moisture absorption deteriorates the permittivity (k) of La2 O3 films on silicon because of the formation of hexagonal La (OH)3 with a low permittivity after films were exposed to the air. Therefore, the moisture absorption should be a very possible reason for the permittivity variation of La2 O3 film in literatures reported, so far. Furthermore, a roughness enhancement was also observed after La2 O3 films were exposed to the air for several hours. This observation should be another concern of hygroscopic La2 O3 film application.

AB - Effects of moisture absorption on permittivity and surface roughness of lanthanum oxide (La2 O3) films were investigated. It was found that the moisture absorption deteriorates the permittivity (k) of La2 O3 films on silicon because of the formation of hexagonal La (OH)3 with a low permittivity after films were exposed to the air. Therefore, the moisture absorption should be a very possible reason for the permittivity variation of La2 O3 film in literatures reported, so far. Furthermore, a roughness enhancement was also observed after La2 O3 films were exposed to the air for several hours. This observation should be another concern of hygroscopic La2 O3 film application.

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Moisture-absorption-induced permittivity deterioration and surface roughness enhancement of lanthanum oxide films on silicon

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