Monitoring reaction products of novolac resists during puddle development

Hideo Eto, Yasuhiro Ito, Tetsuya Homma

Research output: Contribution to journalArticle

2 Citations (Scopus)

Abstract

We have developed a new technique for monitoring the concentration of reaction products during puddle development in ultralarge-scale integration (ULSI) lithography. Optical measurement has been employed for monitoring the concentration of reaction products by detecting reflected light from a wafer surface, and compared with the sampling method (UV-visible spectroscopy) for reaction products from a developer solution. A correlation coefficient of 0.89 was obtained, indicating a good correlation between this optical method and sampling method. We concluded that the newly developed optical monitoring technique is useful for measuring the concentration of reaction products.

Original languageEnglish
Pages (from-to)128-130
Number of pages3
JournalJapanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers
Volume46
Issue number1
DOIs
Publication statusPublished - 2007 Jan 10

Fingerprint

Reaction products
reaction products
Monitoring
sampling
Sampling
photographic developers
optical measurement
correlation coefficients
Lithography
lithography
Spectroscopy
wafers
optics
spectroscopy

Keywords

  • Developer solution
  • Lambert-Beer's law
  • Optical monitoring technique
  • Puddle development
  • Reaction product

ASJC Scopus subject areas

  • Physics and Astronomy (miscellaneous)

Cite this

Monitoring reaction products of novolac resists during puddle development. / Eto, Hideo; Ito, Yasuhiro; Homma, Tetsuya.

In: Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers, Vol. 46, No. 1, 10.01.2007, p. 128-130.

Research output: Contribution to journalArticle

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