N-implanted Ti thin film prepared by ion beam sputtering deposition.

S. Muraishi, T. Aizawa

Research output: Contribution to journalArticle

Original languageEnglish
Pages (from-to)155-163
JournalJ. Ceramic Transaction.
Volume148 (2004)
Publication statusPublished - 2003 Jun 1

Cite this

N-implanted Ti thin film prepared by ion beam sputtering deposition. / Muraishi, S.; Aizawa, T.

In: J. Ceramic Transaction., Vol. 148 (2004), 01.06.2003, p. 155-163.

Research output: Contribution to journalArticle

Muraishi, S & Aizawa, T 2003, 'N-implanted Ti thin film prepared by ion beam sputtering deposition.', J. Ceramic Transaction., vol. 148 (2004), pp. 155-163.
Muraishi, S. ; Aizawa, T. / N-implanted Ti thin film prepared by ion beam sputtering deposition. In: J. Ceramic Transaction. 2003 ; Vol. 148 (2004). pp. 155-163.
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