Nano-fabrication using electron-beam-induced deposition combined with low energy ion milling

K. Mitsuishi, Masayuki Shimojo, M. Tanaka, K. Furuya

Research output: Contribution to journalArticle

6 Citations (Scopus)

Abstract

A fabrication technique combining electron-beam-induced deposition and low energy ion milling is suggested. Nanosized deposits fabricated by electron-beam-induced deposition are used as masks for low energy ion milling so that the substrate regions covered with the nano-sized deposits form nanostructures. A check by high-resolution electron microscopy showed that the method can be used to fabricate nanometer-sized structures from various materials with high crystallinity which is very important for device applications.

Original languageEnglish
Pages (from-to)244-246
Number of pages3
JournalNuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms
Volume242
Issue number1-2
DOIs
Publication statusPublished - 2006 Jan
Externally publishedYes

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Keywords

  • Electron-beam-induced deposition
  • Ion-beam milling
  • Nano-fabrication

ASJC Scopus subject areas

  • Surfaces, Coatings and Films
  • Instrumentation
  • Surfaces and Interfaces

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