Nano-fabrication using electron-beam-induced deposition combined with low energy ion milling

K. Mitsuishi, Masayuki Shimojo, M. Tanaka, K. Furuya

Research output: Contribution to journalArticle

6 Citations (Scopus)

Abstract

A fabrication technique combining electron-beam-induced deposition and low energy ion milling is suggested. Nanosized deposits fabricated by electron-beam-induced deposition are used as masks for low energy ion milling so that the substrate regions covered with the nano-sized deposits form nanostructures. A check by high-resolution electron microscopy showed that the method can be used to fabricate nanometer-sized structures from various materials with high crystallinity which is very important for device applications.

Original languageEnglish
Pages (from-to)244-246
Number of pages3
JournalNuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms
Volume242
Issue number1-2
DOIs
Publication statusPublished - 2006 Jan
Externally publishedYes

Fingerprint

nanofabrication
Nanotechnology
Electron beams
Deposits
deposits
electron beams
Ions
High resolution electron microscopy
Masks
Nanostructures
crystallinity
electron microscopy
ions
masks
Fabrication
fabrication
energy
high resolution
Substrates

Keywords

  • Electron-beam-induced deposition
  • Ion-beam milling
  • Nano-fabrication

ASJC Scopus subject areas

  • Surfaces, Coatings and Films
  • Instrumentation
  • Surfaces and Interfaces

Cite this

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AU - Shimojo, Masayuki

AU - Tanaka, M.

AU - Furuya, K.

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N2 - A fabrication technique combining electron-beam-induced deposition and low energy ion milling is suggested. Nanosized deposits fabricated by electron-beam-induced deposition are used as masks for low energy ion milling so that the substrate regions covered with the nano-sized deposits form nanostructures. A check by high-resolution electron microscopy showed that the method can be used to fabricate nanometer-sized structures from various materials with high crystallinity which is very important for device applications.

AB - A fabrication technique combining electron-beam-induced deposition and low energy ion milling is suggested. Nanosized deposits fabricated by electron-beam-induced deposition are used as masks for low energy ion milling so that the substrate regions covered with the nano-sized deposits form nanostructures. A check by high-resolution electron microscopy showed that the method can be used to fabricate nanometer-sized structures from various materials with high crystallinity which is very important for device applications.

KW - Electron-beam-induced deposition

KW - Ion-beam milling

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