Nano-graphitization in amorphous carbon films via electron beam irradiation and the iron implantation

Eiji Iwamura, Tatsuhiko Aizawa

Research output: Chapter in Book/Report/Conference proceedingConference contribution

1 Citation (Scopus)

Abstract

Nano-graphitization from amorphous carbon state is assisted by the electron beam irradiation. An inter-columnar region in the amorphous carbon films with low atomic and electron densities is controlled to have a graphitic structure by relatively low dose electron beam irradiation. This amorphous carbon - beam interaction generates a new type of carbon hybrids where the graphitic inter-columnar network is embedded into amorphous carbon columns. This hybrid film has an exotic mechanical and tribological response: extraordinary reversible deformability up to 8-10 % in normal strain, high wearing resistance and low friction at high normal pressure. A combination of iron-ion implantation with this electron irradiation provides us the other method of nano-graphitization process. An amorphous carbon film including the implanted iron atoms is chemically modified to have a columnar graphitic structure by the electron beam irradiation. In this post-implantation electron beam irradiation, the basic graphitic units with 1-2 nm in size are controlled to align vertically along the film thickness. This type of nano-graphitization has a strong dependency on the iron doses before electron beam irradiation. The above two types of nano-graphitization provides us a new tool to explore the functionalized structural thin films in application.

Original languageEnglish
Title of host publicationMaterials Research Society Symposium Proceedings
Pages105-111
Number of pages7
Volume960
Publication statusPublished - 2007
Externally publishedYes
Event2006 MRS Fall Meeting - Boston, MA
Duration: 2006 Nov 272006 Dec 1

Other

Other2006 MRS Fall Meeting
CityBoston, MA
Period06/11/2706/12/1

Fingerprint

Graphitization
Carbon films
Amorphous carbon
Amorphous films
Electron beams
Iron
Irradiation
Dosimetry
Electron irradiation
Beam plasma interactions
Formability
Ion implantation
Carrier concentration
Film thickness
Carbon
Friction
Thin films
Atoms

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials

Cite this

Iwamura, E., & Aizawa, T. (2007). Nano-graphitization in amorphous carbon films via electron beam irradiation and the iron implantation. In Materials Research Society Symposium Proceedings (Vol. 960, pp. 105-111)

Nano-graphitization in amorphous carbon films via electron beam irradiation and the iron implantation. / Iwamura, Eiji; Aizawa, Tatsuhiko.

Materials Research Society Symposium Proceedings. Vol. 960 2007. p. 105-111.

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Iwamura, E & Aizawa, T 2007, Nano-graphitization in amorphous carbon films via electron beam irradiation and the iron implantation. in Materials Research Society Symposium Proceedings. vol. 960, pp. 105-111, 2006 MRS Fall Meeting, Boston, MA, 06/11/27.
Iwamura E, Aizawa T. Nano-graphitization in amorphous carbon films via electron beam irradiation and the iron implantation. In Materials Research Society Symposium Proceedings. Vol. 960. 2007. p. 105-111
Iwamura, Eiji ; Aizawa, Tatsuhiko. / Nano-graphitization in amorphous carbon films via electron beam irradiation and the iron implantation. Materials Research Society Symposium Proceedings. Vol. 960 2007. pp. 105-111
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