Negative Epoxy Resist for Permanent Use Optimized for Proton Beam Writing

H. Nishikawa, T. Nishiura, T. Mita, T. Takemori

Research output: Contribution to journal › Article › peer-review

Original language	English
Journal	International Conference on Materials for Advanced Technologies (ICMAT2011), Symposium BB
Publication status	Published - 2011 Jun 1

Cite this

@article{39a6b016b477429db8cdb253439b14b0,

title = "Negative Epoxy Resist for Permanent Use Optimized for Proton Beam Writing",

author = "H. Nishikawa and T. Nishiura and T. Mita and T. Takemori",

year = "2011",

month = jun,

day = "1",

language = "English",

journal = "International Conference on Materials for Advanced Technologies (ICMAT2011), Symposium BB",

}

TY - JOUR

T1 - Negative Epoxy Resist for Permanent Use Optimized for Proton Beam Writing

AU - Nishikawa, H.

AU - Nishiura, T.

AU - Mita, T.

AU - Takemori, T.

PY - 2011/6/1

Y1 - 2011/6/1

M3 - Article

JO - International Conference on Materials for Advanced Technologies (ICMAT2011), Symposium BB

JF - International Conference on Materials for Advanced Technologies (ICMAT2011), Symposium BB

ER -