New cloth modeling for designing dyed patterns

Yuki Morimoto, Kenji Ono

Research output: Chapter in Book/Report/Conference proceedingConference contribution

2 Citations (Scopus)

Abstract

We propose a novel cloth modeling method to simulate dyeing techniques. Morimoto et al. [2007] proposed a physics-based dyeing simulation method. To simulate dyeing techniques in conjunction with folded 3D cloth geometries, we developed a natural and intuitive method to generate cloth geometries. This method uses locally applied geometric operations for multiple dyed patterns on a cloth and a Voronoi diagram based stitching algorithm for cloth gathering. It is not intuitive to generate some folded cloth geometries with one cloth, due to the requisite complexity of the cloth geometry. Instead, we implemented a novel sketch-based interface to divide a cloth patch for local geometric operation and for independent stitching operations. Our method provide an intuitive design platform for dyeing patterns.

Original languageEnglish
Title of host publicationACM SIGGRAPH ASIA 2010 Posters, SA'10
DOIs
Publication statusPublished - 2010
Externally publishedYes
EventACM SIGGRAPH ASIA 2010 Posters, SA'10 - Seoul, Korea, Republic of
Duration: 2010 Dec 152010 Dec 18

Other

OtherACM SIGGRAPH ASIA 2010 Posters, SA'10
CountryKorea, Republic of
CitySeoul
Period10/12/1510/12/18

Fingerprint

Dyeing
Geometry
Physics

ASJC Scopus subject areas

  • Computer Graphics and Computer-Aided Design
  • Computer Vision and Pattern Recognition

Cite this

Morimoto, Y., & Ono, K. (2010). New cloth modeling for designing dyed patterns. In ACM SIGGRAPH ASIA 2010 Posters, SA'10 [11] https://doi.org/10.1145/1900354.1900366

New cloth modeling for designing dyed patterns. / Morimoto, Yuki; Ono, Kenji.

ACM SIGGRAPH ASIA 2010 Posters, SA'10. 2010. 11.

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Morimoto, Y & Ono, K 2010, New cloth modeling for designing dyed patterns. in ACM SIGGRAPH ASIA 2010 Posters, SA'10., 11, ACM SIGGRAPH ASIA 2010 Posters, SA'10, Seoul, Korea, Republic of, 10/12/15. https://doi.org/10.1145/1900354.1900366
Morimoto Y, Ono K. New cloth modeling for designing dyed patterns. In ACM SIGGRAPH ASIA 2010 Posters, SA'10. 2010. 11 https://doi.org/10.1145/1900354.1900366
Morimoto, Yuki ; Ono, Kenji. / New cloth modeling for designing dyed patterns. ACM SIGGRAPH ASIA 2010 Posters, SA'10. 2010.
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