Abstract
A new p-channel two dimensional hole gas (2DHG) heterostructure FET (HFET) which operates in MIS transistor-like mode has been fabricated on an undoped AlGaAs/GaAs heterostructure grown by molecular beam epitaxy (MBE). The device operates entirely in an enhancement-mode with a threshold voltage of minus 0. 3 V at both 300 K and 77 K. Maximum values of transconductances of 17 ms/mm at 300 K and 40 mS/mm at 77 K have been achieved in a 1 mu m gate length structure. As the present p-channel device is very simple, a complementary circuit scheme using a p-channel 2DHG HFET of this type will be most promising in future.
| Original language | English |
|---|---|
| Title of host publication | Japanese Journal of Applied Physics, Part 2: Letters |
| Pages | 335-337 |
| Number of pages | 3 |
| Volume | 24 |
| Edition | 5 |
| Publication status | Published - 1985 May |
| Externally published | Yes |
ASJC Scopus subject areas
- Engineering(all)
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Cite this
Oe, K., Hirano, M., Arai, K., & Yanagawa, F. (1985). NEW p-CHANNEL AlGaAs/GaAs MIS-LIKE HETEROSTRUCTURE FET EMPLOYING TWO DIMENSIONAL HOLE GAS. In Japanese Journal of Applied Physics, Part 2: Letters (5 ed., Vol. 24, pp. 335-337)