Multilevel interconnection technology has become essential for the development of high density and high integration of LSIs in recent years. Planarization of interlayer dielectrics is very important for highly reliable, fine multilevel interconnections. In this article, we will discuss the development process and the features of a new polyimide siloxane film in contrast with problems of conventional polyimide film, and will outline the practical application.
|Number of pages||6|
|Journal||JEE. Journal of electronic engineering|
|Publication status||Published - 1988 Nov 1|
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