Newly developed high-speed rotating disk chemical vapor deposition equipment for poly-Si films

Fujio Terai, Hiroaki Kobayashi, Shuji Katsui, Yuusuke Sato, Takao Nagatomo, Tetsuya Homma

Research output: Contribution to journalArticle

7 Citations (Scopus)

Abstract

We have developed high-speed rotating disk chemical vapor deposition (CVD) equipment. A high deposition rate, good thickness uniformity and few particles were achieved for polycrystalline silicon (poly-Si) film deposition on a 200-mm-diameter silicon (Si) wafer, by optimizing the structure of the rotating disk CVD equipment. A magnetic bearing motor was used for rotating and controlling the 200-mm-diameter wafer at 3000 rpm, and the substrate temperature was controlled to be 600-900°C. Gas flow was also controlled to avoid the re-adsorption of reaction by-products onto the wafer surface. A deposition rate of 316 nm/min, a film thickness nonuniformity ±3%, and less than 20 particles (over 200 nm in diameter) were achieved at a deposition temperature of 680°C for poly-Si deposition on the 200-mm-diameter wafer. These results show that the number of particles can be reduced even at a high deposition rate. The mechanisms of the high performance for poly-Si deposition are considered to be the reduction in the thickness of the boundary layer of temperature above the wafer surface and the suppression of the vapor-phase reaction.

Original languageEnglish
Pages (from-to)125-130
Number of pages6
JournalJapanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers
Volume44
Issue number1 A
DOIs
Publication statusPublished - 2005 Jan

Fingerprint

rotating disks
Rotating disks
silicon films
Polysilicon
Chemical vapor deposition
Deposition rates
high speed
vapor deposition
wafers
Magnetic bearings
Silicon wafers
Temperature
silicon
Byproducts
Flow of gases
Film thickness
Boundary layers
magnetic bearings
Vapors
Adsorption

Keywords

  • CVD
  • Particle
  • Poly-Si
  • Rotating disk
  • Temperature
  • Uniformity

ASJC Scopus subject areas

  • Physics and Astronomy (miscellaneous)

Cite this

Newly developed high-speed rotating disk chemical vapor deposition equipment for poly-Si films. / Terai, Fujio; Kobayashi, Hiroaki; Katsui, Shuji; Sato, Yuusuke; Nagatomo, Takao; Homma, Tetsuya.

In: Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers, Vol. 44, No. 1 A, 01.2005, p. 125-130.

Research output: Contribution to journalArticle

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