Ni electroplating on a resist micro-machined by proton beam writing

Naoyuki Uchiya, Yusuke Furuta, Hiroyuki Nishikawa, Tohru Watanabe, Junji Haga, Takahiro Satoh, Masakazu Oikawa, Yasuyuki Ishii, Tomihiro Kamiya

Research output: Contribution to journalArticle

15 Citations (Scopus)

Abstract

In this paper we report fabrication of high-aspect-ratio micro-structure of Ni by electroplating, using a micro-machining technique of resists using proton beam writing (PBW) at Japan Atomic Energy Agency (JAEA). A micro-structure of 5 μm thick PMMA was fabricated by exposure using PBW at 1.7 MeV and by development. A Ni structure was then formed by electroplating on the micro-structure of PMMA. Vertical and smooth side walls observed by a scanning electron microscope (SEM) indicate that PBW can be a versatile tool for fabrication of resists and metal microstructure in combination with electroplating. The electroplated Ni structure can be used as a resolution standard, which enabled us to focus the proton beam down to 130 nm.

Original languageEnglish
Pages (from-to)1537-1540
Number of pages4
JournalMicrosystem Technologies
Volume14
Issue number9-11
DOIs
Publication statusPublished - 2008 Oct 1

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Hardware and Architecture
  • Electrical and Electronic Engineering

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    Uchiya, N., Furuta, Y., Nishikawa, H., Watanabe, T., Haga, J., Satoh, T., Oikawa, M., Ishii, Y., & Kamiya, T. (2008). Ni electroplating on a resist micro-machined by proton beam writing. Microsystem Technologies, 14(9-11), 1537-1540. https://doi.org/10.1007/s00542-007-0549-0