Ni electroplating on a resist micro-machined by proton beam writing

Naoyuki Uchiya, Yusuke Furuta, Hiroyuki Nishikawa, Tohru Watanabe, Junji Haga, Takahiro Satoh, Masakazu Oikawa, Yasuyuki Ishii, Tomihiro Kamiya

Research output: Contribution to journalArticle

15 Citations (Scopus)

Abstract

In this paper we report fabrication of high-aspect-ratio micro-structure of Ni by electroplating, using a micro-machining technique of resists using proton beam writing (PBW) at Japan Atomic Energy Agency (JAEA). A micro-structure of 5 μm thick PMMA was fabricated by exposure using PBW at 1.7 MeV and by development. A Ni structure was then formed by electroplating on the micro-structure of PMMA. Vertical and smooth side walls observed by a scanning electron microscope (SEM) indicate that PBW can be a versatile tool for fabrication of resists and metal microstructure in combination with electroplating. The electroplated Ni structure can be used as a resolution standard, which enabled us to focus the proton beam down to 130 nm.

Original languageEnglish
Pages (from-to)1537-1540
Number of pages4
JournalMicrosystem Technologies
Volume14
Issue number9-11
DOIs
Publication statusPublished - 2008 Oct

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Proton beams
electroplating
Electroplating
proton beams
microstructure
Microstructure
Polymethyl Methacrylate
Fabrication
fabrication
nuclear energy
high aspect ratio
machining
Nuclear energy
Aspect ratio
Japan
Machining
Electron microscopes
electron microscopes
Metals
Scanning

ASJC Scopus subject areas

  • Electrical and Electronic Engineering
  • Instrumentation

Cite this

Uchiya, N., Furuta, Y., Nishikawa, H., Watanabe, T., Haga, J., Satoh, T., ... Kamiya, T. (2008). Ni electroplating on a resist micro-machined by proton beam writing. Microsystem Technologies, 14(9-11), 1537-1540. https://doi.org/10.1007/s00542-007-0549-0

Ni electroplating on a resist micro-machined by proton beam writing. / Uchiya, Naoyuki; Furuta, Yusuke; Nishikawa, Hiroyuki; Watanabe, Tohru; Haga, Junji; Satoh, Takahiro; Oikawa, Masakazu; Ishii, Yasuyuki; Kamiya, Tomihiro.

In: Microsystem Technologies, Vol. 14, No. 9-11, 10.2008, p. 1537-1540.

Research output: Contribution to journalArticle

Uchiya, N, Furuta, Y, Nishikawa, H, Watanabe, T, Haga, J, Satoh, T, Oikawa, M, Ishii, Y & Kamiya, T 2008, 'Ni electroplating on a resist micro-machined by proton beam writing', Microsystem Technologies, vol. 14, no. 9-11, pp. 1537-1540. https://doi.org/10.1007/s00542-007-0549-0
Uchiya, Naoyuki ; Furuta, Yusuke ; Nishikawa, Hiroyuki ; Watanabe, Tohru ; Haga, Junji ; Satoh, Takahiro ; Oikawa, Masakazu ; Ishii, Yasuyuki ; Kamiya, Tomihiro. / Ni electroplating on a resist micro-machined by proton beam writing. In: Microsystem Technologies. 2008 ; Vol. 14, No. 9-11. pp. 1537-1540.
@article{9962df29a9e344058c9f3389307a78dd,
title = "Ni electroplating on a resist micro-machined by proton beam writing",
abstract = "In this paper we report fabrication of high-aspect-ratio micro-structure of Ni by electroplating, using a micro-machining technique of resists using proton beam writing (PBW) at Japan Atomic Energy Agency (JAEA). A micro-structure of 5 μm thick PMMA was fabricated by exposure using PBW at 1.7 MeV and by development. A Ni structure was then formed by electroplating on the micro-structure of PMMA. Vertical and smooth side walls observed by a scanning electron microscope (SEM) indicate that PBW can be a versatile tool for fabrication of resists and metal microstructure in combination with electroplating. The electroplated Ni structure can be used as a resolution standard, which enabled us to focus the proton beam down to 130 nm.",
author = "Naoyuki Uchiya and Yusuke Furuta and Hiroyuki Nishikawa and Tohru Watanabe and Junji Haga and Takahiro Satoh and Masakazu Oikawa and Yasuyuki Ishii and Tomihiro Kamiya",
year = "2008",
month = "10",
doi = "10.1007/s00542-007-0549-0",
language = "English",
volume = "14",
pages = "1537--1540",
journal = "Microsystem Technologies",
issn = "0946-7076",
publisher = "Springer Verlag",
number = "9-11",

}

TY - JOUR

T1 - Ni electroplating on a resist micro-machined by proton beam writing

AU - Uchiya, Naoyuki

AU - Furuta, Yusuke

AU - Nishikawa, Hiroyuki

AU - Watanabe, Tohru

AU - Haga, Junji

AU - Satoh, Takahiro

AU - Oikawa, Masakazu

AU - Ishii, Yasuyuki

AU - Kamiya, Tomihiro

PY - 2008/10

Y1 - 2008/10

N2 - In this paper we report fabrication of high-aspect-ratio micro-structure of Ni by electroplating, using a micro-machining technique of resists using proton beam writing (PBW) at Japan Atomic Energy Agency (JAEA). A micro-structure of 5 μm thick PMMA was fabricated by exposure using PBW at 1.7 MeV and by development. A Ni structure was then formed by electroplating on the micro-structure of PMMA. Vertical and smooth side walls observed by a scanning electron microscope (SEM) indicate that PBW can be a versatile tool for fabrication of resists and metal microstructure in combination with electroplating. The electroplated Ni structure can be used as a resolution standard, which enabled us to focus the proton beam down to 130 nm.

AB - In this paper we report fabrication of high-aspect-ratio micro-structure of Ni by electroplating, using a micro-machining technique of resists using proton beam writing (PBW) at Japan Atomic Energy Agency (JAEA). A micro-structure of 5 μm thick PMMA was fabricated by exposure using PBW at 1.7 MeV and by development. A Ni structure was then formed by electroplating on the micro-structure of PMMA. Vertical and smooth side walls observed by a scanning electron microscope (SEM) indicate that PBW can be a versatile tool for fabrication of resists and metal microstructure in combination with electroplating. The electroplated Ni structure can be used as a resolution standard, which enabled us to focus the proton beam down to 130 nm.

UR - http://www.scopus.com/inward/record.url?scp=49949104383&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=49949104383&partnerID=8YFLogxK

U2 - 10.1007/s00542-007-0549-0

DO - 10.1007/s00542-007-0549-0

M3 - Article

VL - 14

SP - 1537

EP - 1540

JO - Microsystem Technologies

JF - Microsystem Technologies

SN - 0946-7076

IS - 9-11

ER -