Observation of quill effect induced by distortion of spatial beam profile

Shigeki Matsuo, Kei Enjo Yoshifumi Umeda, Shuichi Hashimoto

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

Femtosecond laser modification was carried out for silica substrates using spatially distorted pulses. Modified lines were inscribed in the alternative scanning directions. Etching of the sample revealed significant difference in etching rate, representing Quill effect. Also, the etching rates were affected by the distortion of the spatial beam profile. These results suggest the possibility to control the characteristics of the modified region by controlling the beam profile.

Original languageEnglish
Title of host publicationMATEC Web of Conferences
PublisherEDP Sciences
Volume8
DOIs
Publication statusPublished - 2013
Externally publishedYes
EventWorkshop on Progress in Ultrafast Laser Modifications of Materials, 2013 - Cargese, France
Duration: 2013 Apr 142013 Apr 19

Other

OtherWorkshop on Progress in Ultrafast Laser Modifications of Materials, 2013
CountryFrance
CityCargese
Period13/4/1413/4/19

    Fingerprint

ASJC Scopus subject areas

  • Chemistry(all)
  • Engineering(all)
  • Materials Science(all)

Cite this

Matsuo, S., Umeda, K. E. Y., & Hashimoto, S. (2013). Observation of quill effect induced by distortion of spatial beam profile. In MATEC Web of Conferences (Vol. 8). [01006] EDP Sciences. https://doi.org/10.1051/matecconf/20130801006