Observation of quill effect induced by distortion of spatial beam profile

Shigeki Matsuo, Kei Enjo Yoshifumi Umeda, Shuichi Hashimoto

Research output: Contribution to journalConference article

Abstract

Femtosecond laser modification was carried out for silica substrates using spatially distorted pulses. Modified lines were inscribed in the alternative scanning directions. Etching of the sample revealed significant difference in etching rate, representing Quill effect. Also, the etching rates were affected by the distortion of the spatial beam profile. These results suggest the possibility to control the characteristics of the modified region by controlling the beam profile.

Original languageEnglish
Article number01006
JournalMATEC Web of Conferences
Volume8
DOIs
Publication statusPublished - 2013 Jan 1
Externally publishedYes
EventWorkshop on Progress in Ultrafast Laser Modifications of Materials, 2013 - Cargese, France
Duration: 2013 Apr 142013 Apr 19

ASJC Scopus subject areas

  • Chemistry(all)
  • Materials Science(all)
  • Engineering(all)

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