Femtosecond laser modification was carried out for silica substrates using spatially distorted pulses. Modified lines were inscribed in the alternative scanning directions. Etching of the sample revealed significant difference in etching rate, representing Quill effect. Also, the etching rates were affected by the distortion of the spatial beam profile. These results suggest the possibility to control the characteristics of the modified region by controlling the beam profile.
|Journal||MATEC Web of Conferences|
|Publication status||Published - 2013 Jan 1|
|Event||Workshop on Progress in Ultrafast Laser Modifications of Materials, 2013 - Cargese, France|
Duration: 2013 Apr 14 → 2013 Apr 19
ASJC Scopus subject areas
- Materials Science(all)