Optical and Electrical Studies on Point Defects in Amorphous SiO2 Films

H. Nishikawa, E. Watanabe, D. Ito

Research output: Contribution to journalArticle

Original languageEnglish
Pages (from-to)5031-5036
JournalMemoirs of Faculty of Engineering
Publication statusPublished - 1995 Jan 1

Cite this

Optical and Electrical Studies on Point Defects in Amorphous SiO2 Films. / Nishikawa, H.; Watanabe, E.; Ito, D.

In: Memoirs of Faculty of Engineering, 01.01.1995, p. 5031-5036.

Research output: Contribution to journalArticle

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