Optical characteristics of SiO2 formed by plasma-enhanced chemical-vapor deposition of tetraethoxysilane

K. Ishii, Y. Ohki, H. Nishikawa

Research output: Contribution to journalArticle

20 Citations (Scopus)
Original languageEnglish
Pages (from-to)5418-5422
JournalJournal of Applied Physics
Volume76
Publication statusPublished - 1994 Nov 1

Cite this

Optical characteristics of SiO2 formed by plasma-enhanced chemical-vapor deposition of tetraethoxysilane. / Ishii, K.; Ohki, Y.; Nishikawa, H.

In: Journal of Applied Physics, Vol. 76, 01.11.1994, p. 5418-5422.

Research output: Contribution to journalArticle

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AU - Ishii, K.

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AU - Nishikawa, H.

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