Optical characteristics of SiO2 formed by plasma-enhanced chemical-vapor deposition of tetraethoxysilane

K. Ishii, Y. Ohki, H. Nishikawa

Research output: Contribution to journal › Article

Cite this

@article{1fe81d0ecebd4d22a6fb6969a51a9960,

title = "Optical characteristics of SiO2 formed by plasma-enhanced chemical-vapor deposition of tetraethoxysilane",

author = "K. Ishii and Y. Ohki and H. Nishikawa",

year = "1994",

month = nov,

day = "1",

language = "English",

volume = "76",

pages = "5418--5422",

journal = "Journal of Applied Physics",

issn = "0021-8979",

publisher = "American Institute of Physics Publising LLC",

}