Original language | English |
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Pages (from-to) | 5418-5422 |
Journal | Journal of Applied Physics |
Volume | 76 |
Publication status | Published - 1994 Nov 1 |
Optical characteristics of SiO2 formed by plasma-enhanced chemical-vapor deposition of tetraethoxysilane
K. Ishii, Y. Ohki, H. Nishikawa
Research output: Contribution to journal › Article › peer-review
20
Citations
(Scopus)