Optical isolator with amorphous silicon waveguide core on magneto-optical garnet

K. Miura, T. Hirasawa, J. Kang, Y. Shoji, Y. Okada, Hideki Yokoi, N. Nishiyama, S. Arai, T. Mizumoto

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

An optical isolator is fabricated with an amorphous silicon waveguide core deposited using a plasma-enhanced chemical-vapor-deposition technique on a magneto-optical garnet Ce:YIG. An isolation ratio of 17 dB is demonstrated.

Original languageEnglish
Title of host publicationIEEE International Conference on Group IV Photonics GFP
PublisherIEEE Computer Society
Pages116-117
Number of pages2
ISBN (Print)9781479922833
DOIs
Publication statusPublished - 2014 Nov 18
Event11th International Conference on Group IV Photonics, GFP 2014 - Paris
Duration: 2014 Aug 272014 Aug 29

Other

Other11th International Conference on Group IV Photonics, GFP 2014
CityParis
Period14/8/2714/8/29

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ASJC Scopus subject areas

  • Electrical and Electronic Engineering
  • Ceramics and Composites
  • Electronic, Optical and Magnetic Materials

Cite this

Miura, K., Hirasawa, T., Kang, J., Shoji, Y., Okada, Y., Yokoi, H., ... Mizumoto, T. (2014). Optical isolator with amorphous silicon waveguide core on magneto-optical garnet. In IEEE International Conference on Group IV Photonics GFP (pp. 116-117). [6961954] IEEE Computer Society. https://doi.org/10.1109/Group4.2014.6961954