Optical isolator with amorphous silicon waveguide core on magneto-optical garnet

K. Miura, T. Hirasawa, J. Kang, Y. Shoji, Y. Okada, H. Yokoi, N. Nishiyama, S. Arai, T. Mizumoto

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

An optical isolator is fabricated with an amorphous silicon waveguide core deposited using a plasma-enhanced chemical-vapor-deposition technique on a magneto-optical garnet Ce:YIG. An isolation ratio of 17 dB is demonstrated.

Original languageEnglish
Title of host publicationIEEE International Conference on Group IV Photonics GFP
PublisherIEEE Computer Society
Pages116-117
Number of pages2
ISBN (Electronic)9781479922833
DOIs
Publication statusPublished - 2014 Nov 18
Event11th International Conference on Group IV Photonics, GFP 2014 - Paris, France
Duration: 2014 Aug 272014 Aug 29

Publication series

NameIEEE International Conference on Group IV Photonics GFP
ISSN (Print)1949-2081

Conference

Conference11th International Conference on Group IV Photonics, GFP 2014
CountryFrance
CityParis
Period14/8/2714/8/29

ASJC Scopus subject areas

  • Electrical and Electronic Engineering
  • Ceramics and Composites
  • Electronic, Optical and Magnetic Materials

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  • Cite this

    Miura, K., Hirasawa, T., Kang, J., Shoji, Y., Okada, Y., Yokoi, H., Nishiyama, N., Arai, S., & Mizumoto, T. (2014). Optical isolator with amorphous silicon waveguide core on magneto-optical garnet. In IEEE International Conference on Group IV Photonics GFP (pp. 116-117). [6961954] (IEEE International Conference on Group IV Photonics GFP). IEEE Computer Society. https://doi.org/10.1109/Group4.2014.6961954