Abstract
An optical isolator employing a nonreciprocal guided-radiation mode conversion is described. The optical isolator composes of a magneto-optic waveguide with a Si guiding layer, which can be realized by photosensitive adhesive bonding. The optical isolator was designed at a wavelength of 1.55 μm. Relationship of waveguide parameters was clarified for isolator operation. Dependence of the thickness of an adhesive layer was investigated for the design of the optical isolator.
| Original language | English |
|---|---|
| Title of host publication | Semiconductor Wafer Bonding: Science, Technology and Applications 14 |
| Publisher | Electrochemical Society Inc. |
| Pages | 215-220 |
| Number of pages | 6 |
| Volume | 75 |
| Edition | 9 |
| ISBN (Electronic) | 9781607685395 |
| DOIs | |
| Publication status | Published - 2016 |
| Event | Symposium on Semiconductor Wafer Bonding: Science, Technology and Applications 14 - PRiME 2016/230th ECS Meeting - Honolulu, United States Duration: 2016 Oct 2 → 2016 Oct 7 |
Other
| Other | Symposium on Semiconductor Wafer Bonding: Science, Technology and Applications 14 - PRiME 2016/230th ECS Meeting |
|---|---|
| Country | United States |
| City | Honolulu |
| Period | 16/10/2 → 16/10/7 |
ASJC Scopus subject areas
- Engineering(all)
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Cite this
Yokoi, H., Choowitsakunlert, S., Kobayashi, K., & Takagiwa, K. (2016). Optical isolator with Si guiding layer fabricated by photosensitive adhesive bonding. In Semiconductor Wafer Bonding: Science, Technology and Applications 14 (9 ed., Vol. 75, pp. 215-220). Electrochemical Society Inc.. https://doi.org/10.1149/07509.0215ecst