Optical isolator with Si guiding layer fabricated by photosensitive adhesive bonding

Hideki Yokoi, S. Choowitsakunlert, K. Kobayashi, K. Takagiwa

Research output: Chapter in Book/Report/Conference proceedingConference contribution

2 Citations (Scopus)

Abstract

An optical isolator employing a nonreciprocal guided-radiation mode conversion is described. The optical isolator composes of a magneto-optic waveguide with a Si guiding layer, which can be realized by photosensitive adhesive bonding. The optical isolator was designed at a wavelength of 1.55 μm. Relationship of waveguide parameters was clarified for isolator operation. Dependence of the thickness of an adhesive layer was investigated for the design of the optical isolator.

Original languageEnglish
Title of host publicationSemiconductor Wafer Bonding: Science, Technology and Applications 14
PublisherElectrochemical Society Inc.
Pages215-220
Number of pages6
Volume75
Edition9
ISBN (Electronic)9781607685395
DOIs
Publication statusPublished - 2016
EventSymposium on Semiconductor Wafer Bonding: Science, Technology and Applications 14 - PRiME 2016/230th ECS Meeting - Honolulu, United States
Duration: 2016 Oct 22016 Oct 7

Other

OtherSymposium on Semiconductor Wafer Bonding: Science, Technology and Applications 14 - PRiME 2016/230th ECS Meeting
CountryUnited States
CityHonolulu
Period16/10/216/10/7

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ASJC Scopus subject areas

  • Engineering(all)

Cite this

Yokoi, H., Choowitsakunlert, S., Kobayashi, K., & Takagiwa, K. (2016). Optical isolator with Si guiding layer fabricated by photosensitive adhesive bonding. In Semiconductor Wafer Bonding: Science, Technology and Applications 14 (9 ed., Vol. 75, pp. 215-220). Electrochemical Society Inc.. https://doi.org/10.1149/07509.0215ecst