Abstract
An optical isolator employing a nonreciprocal guided-radiation mode conversion is described. The optical isolator composes of a magneto-optic waveguide with a Si guiding layer, which can be realized by photosensitive adhesive bonding. The optical isolator was designed at a wavelength of 1.55 μm. Relationship of waveguide parameters was clarified for isolator operation. Dependence of the thickness of an adhesive layer was investigated for the design of the optical isolator.
| Original language | English |
|---|---|
| Title of host publication | Semiconductor Wafer Bonding: Science, Technology and Applications 14 |
| Publisher | Electrochemical Society Inc. |
| Pages | 215-220 |
| Number of pages | 6 |
| Volume | 75 |
| Edition | 9 |
| ISBN (Electronic) | 9781607685395 |
| DOIs | |
| Publication status | Published - 2016 |
| Event | Symposium on Semiconductor Wafer Bonding: Science, Technology and Applications 14 - PRiME 2016/230th ECS Meeting - Honolulu, United States Duration: 2016 Oct 2 → 2016 Oct 7 |
Other
| Other | Symposium on Semiconductor Wafer Bonding: Science, Technology and Applications 14 - PRiME 2016/230th ECS Meeting |
|---|---|
| Country | United States |
| City | Honolulu |
| Period | 16/10/2 → 16/10/7 |
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ASJC Scopus subject areas
- Engineering(all)
Cite this
Optical isolator with Si guiding layer fabricated by photosensitive adhesive bonding. / Yokoi, Hideki; Choowitsakunlert, S.; Kobayashi, K.; Takagiwa, K.
Semiconductor Wafer Bonding: Science, Technology and Applications 14. Vol. 75 9. ed. Electrochemical Society Inc., 2016. p. 215-220.Research output: Chapter in Book/Report/Conference proceeding › Conference contribution
}
TY - GEN
T1 - Optical isolator with Si guiding layer fabricated by photosensitive adhesive bonding
AU - Yokoi, Hideki
AU - Choowitsakunlert, S.
AU - Kobayashi, K.
AU - Takagiwa, K.
PY - 2016
Y1 - 2016
N2 - An optical isolator employing a nonreciprocal guided-radiation mode conversion is described. The optical isolator composes of a magneto-optic waveguide with a Si guiding layer, which can be realized by photosensitive adhesive bonding. The optical isolator was designed at a wavelength of 1.55 μm. Relationship of waveguide parameters was clarified for isolator operation. Dependence of the thickness of an adhesive layer was investigated for the design of the optical isolator.
AB - An optical isolator employing a nonreciprocal guided-radiation mode conversion is described. The optical isolator composes of a magneto-optic waveguide with a Si guiding layer, which can be realized by photosensitive adhesive bonding. The optical isolator was designed at a wavelength of 1.55 μm. Relationship of waveguide parameters was clarified for isolator operation. Dependence of the thickness of an adhesive layer was investigated for the design of the optical isolator.
UR - http://www.scopus.com/inward/record.url?scp=84991480427&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=84991480427&partnerID=8YFLogxK
U2 - 10.1149/07509.0215ecst
DO - 10.1149/07509.0215ecst
M3 - Conference contribution
VL - 75
SP - 215
EP - 220
BT - Semiconductor Wafer Bonding: Science, Technology and Applications 14
PB - Electrochemical Society Inc.
ER -