TY - GEN
T1 - Optical isolator with Si guiding layer fabricated by uv-activated bonding
AU - Yokoi, H.
AU - Sasaki, K.
PY - 2008/12/1
Y1 - 2008/12/1
N2 - An interferometric optical isolator, with a Si guiding layer, employing a nonreciprocal phase shift has been studied. The optical isolator is comprised of a magneto-optic waveguide with a magnetic garnet/Si/SiO2 structure, which is fabricated by wafer bonding technique. The nonreciprocal phase shift was calculated for magneto-optic waveguides with various layer structures. Wafer bonding between a garnet crystal and Si was also investigated.
AB - An interferometric optical isolator, with a Si guiding layer, employing a nonreciprocal phase shift has been studied. The optical isolator is comprised of a magneto-optic waveguide with a magnetic garnet/Si/SiO2 structure, which is fabricated by wafer bonding technique. The nonreciprocal phase shift was calculated for magneto-optic waveguides with various layer structures. Wafer bonding between a garnet crystal and Si was also investigated.
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U2 - 10.1149/1.2982865
DO - 10.1149/1.2982865
M3 - Conference contribution
AN - SCOPUS:63149126940
SN - 9781566776547
T3 - ECS Transactions
SP - 155
EP - 161
BT - ECS Transactions - Semiconductor Wafer Bonding 10
T2 - Semiconductor Wafer Bonding 10: Science, Technology, and Applications - 214th ECS Meeting
Y2 - 14 October 2008 through 16 October 2008
ER -