Optical propagation loss increase of (GdBi)3Fe5O12 films caused by sputter etching

Hideki Yokoi, Tetsuya Mizumoto, Yoshiyuki Naito

Research output: Chapter in Book/Report/Conference proceedingChapter

1 Citation (Scopus)

Abstract

Rib waveguides, which are made of magnetic garnet films of composition (GdBi)3Fe5O12 and are fabricated by Ar sputter etching, have large optical propagation loss when Ti is used as the etch mask. The loss increase is alleviated by using a SiO2 mask. X-ray photoelectron spectroscopy analysis reveals that Fe chemical shift due to Ar+ ion bombardment causes increase in the optical absorption loss, and hence the propagation loss.

Original languageEnglish
Title of host publicationJapanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes & Review Papers
Place of PublicationMinato-ku, Japan
PublisherJJAP
Pages4817-4818
Number of pages2
Volume34
Edition9 A
Publication statusPublished - 1995 Sep
Externally publishedYes

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ASJC Scopus subject areas

  • Engineering(all)

Cite this

Yokoi, H., Mizumoto, T., & Naito, Y. (1995). Optical propagation loss increase of (GdBi)3Fe5O12 films caused by sputter etching. In Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes & Review Papers (9 A ed., Vol. 34, pp. 4817-4818). Minato-ku, Japan: JJAP.