Optical properties of fluorinated silicon oxide films by liquid phase deposition for optical waveguides

Tetsuya Homma, Atsushi Satoh, Seiji Okada, Masahiro Itoh, Masaki Yamaguchi, Hideo Takahashi

Research output: Contribution to journalArticle

12 Citations (Scopus)

Abstract

Optical properties of fluorinated silicon oxide (SiOF) films for optical waveguide in optoelectronic devices were investigated. The SiOF films are formed at 25 °C by a liquid phase deposition (LPD) technique using a supersaturated hydrofluosilicic acid (FhSiFe) aqueous solution. Two main absorption peaks corresponding to Si-O and Si-F bonds were observed at the wavenumbers of 1090 and 930 cm-1 in Fourier transform infrared (FTIR) spectrum, respectively. The LPD-SiOF films show very little content of water components such as Si-OH bonds and OH group. Although the transmittance for 600-nmthick LPD-SiOF film gradually decreased from the wavelength around 700 nm, the relative transmittances to quartz glass are over 98% in the wavelength region from 350-2500 nm. The concentration of fluorine atoms in the LPD-SiOF film was about 5%, and the calculated composition was SiOi.gsFo.is. The calculated refractive index from the polarizability for LPD-SiOF film was 1.430, and agrees very well with the measured value at the wavelength of 632.8 nm by ellipsometry. The dispersion of refractive index was evaluated and fitted to a three-term Sellmeier's dispersion equation. The zero dispersion wavelengths for the LPD-SiOF and thermally grown SiO2 films were 1.271 and 1.339 μm, respectively.

Original languageEnglish
Pages (from-to)698-702
Number of pages5
JournalIEEE Transactions on Instrumentation and Measurement
Volume47
Issue number3
DOIs
Publication statusPublished - 1998

Fingerprint

Silicon oxides
Optical waveguides
silicon oxides
optical waveguides
Oxide films
oxide films
liquid phases
Optical properties
optical properties
Liquids
Wavelength
wavelengths
Refractive index
transmittance
refractivity
Ellipsometry
optoelectronic devices
Fluorine
Optoelectronic devices
ellipsometry

Keywords

  • Fluorinated silicon oxide (siof)
  • Heterodyne interference
  • Laser
  • Optical waveguide
  • Refractive index

ASJC Scopus subject areas

  • Electrical and Electronic Engineering
  • Instrumentation

Cite this

Optical properties of fluorinated silicon oxide films by liquid phase deposition for optical waveguides. / Homma, Tetsuya; Satoh, Atsushi; Okada, Seiji; Itoh, Masahiro; Yamaguchi, Masaki; Takahashi, Hideo.

In: IEEE Transactions on Instrumentation and Measurement, Vol. 47, No. 3, 1998, p. 698-702.

Research output: Contribution to journalArticle

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