Optical properties of polycrystalline and epitaxial anatase and rutile TiO 2 thin films by rf magnetron sputtering

S. Tanemura, L. Miao, P. Jin, K. Kaneko, A. Terai, N. Nabatova-Gabain

Research output: Contribution to journalArticle

147 Citations (Scopus)

Abstract

We analyzed successfully the refractive index n, extinction coefficient k, and optical band gap E g of the fabricated polycrystalline and epitaxial TiO 2 films of rutile and anatase films by spectroscopic ellipsometry (SE). The provided samples were prepared by rf magnetron sputtering of TiO 2 target with Ar gas plasma under a variety of sputtering parameters such as total pressure, Ar gas flow rate, O 2 gas flow rate, applied sputtering power, substrate temperature and substrate materials. The covered wavelength for SE was from 0.75 to 5eV (1653-248nm in wavelength). As the conclusion, the films show higher values of refractive indices than the previously reported ones by other authors. Optical band gaps extrapolated by Tauc plot using the obtained extinction coefficient again show higher values than the known bulk data.

Original languageEnglish
Pages (from-to)654-660
Number of pages7
JournalApplied Surface Science
Volume212-213
Issue numberSPEC.
DOIs
Publication statusPublished - 2003 May 15
Externally publishedYes

Keywords

  • Complex refractive index
  • Optical band gap
  • SE
  • Thin film
  • TiO

ASJC Scopus subject areas

  • Chemistry(all)
  • Condensed Matter Physics
  • Physics and Astronomy(all)
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films

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