Optimization of MoCl5 intercalation for low-resistance and low-damage exfoliated highly-oriented pyrolytic graphite

Ekkaphop Ketsombun, Kazuyoshi Ueno

Research output: Contribution to journalArticlepeer-review

Abstract

This study developed a damageless molybdenum pentachloride (MoCl5) intercalation doping process of exfoliated highly-oriented pyrolytic graphite (e-HOPG). We optimized the chemical concentration and reaction temperature and time for doping crystalline multilayer graphene. We found that thick e-HOPG films are more susceptible to intercalation damage than previously reported few-layer graphene. Lowering the chemical concentration reduced the damage; however, there was a trade-off between doping efficiency and damage. Efficient doping with a 77% reduction of sheet resistance without significant damage was achieved by further optimizing the reaction temperature and time with reduced chemical concentration. The correlation plots of G and 2D peak positions in the Raman spectra were used to analyze the strain and carrier density induced during the intercalation process and investigate the cause of damage. The stability of the intercalated e-HOPG was confirmed for storage in a nitrogen box for 40 weeks.

Original languageEnglish
Article number111666
JournalMicroelectronic Engineering
Volume252
DOIs
Publication statusPublished - 2022 Jan 15

Keywords

  • Carrier density
  • e-HOPG
  • Low resistance
  • Mechanical strain
  • MoCl intercalation

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Atomic and Molecular Physics, and Optics
  • Condensed Matter Physics
  • Surfaces, Coatings and Films
  • Electrical and Electronic Engineering

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