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Optimization of MoCl
5
intercalation for low-resistance and low-damage exfoliated highly-oriented pyrolytic graphite
Ekkaphop Ketsombun,
Kazuyoshi Ueno
Functional Control Systems
Department of Electronic Engineering
Electrical Engineering and Computer Science
Research output
:
Contribution to journal
›
Article
›
peer-review
2
Citations (Scopus)
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5
intercalation for low-resistance and low-damage exfoliated highly-oriented pyrolytic graphite'. Together they form a unique fingerprint.
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Physics & Astronomy
boxes
12%
causes
8%
chlorides
13%
damage
47%
graphene
21%
intercalation
76%
low resistance
76%
molybdenum
13%
nitrogen
9%
optimization
44%
plots
10%
pyrolytic graphite
85%
Raman spectra
10%
temperature
7%
Engineering & Materials Science
Carrier concentration
23%
Crystalline materials
17%
Doping (additives)
74%
Graphene
39%
Graphite
66%
Intercalation
100%
Molybdenum
19%
Multilayers
16%
Nitrogen
15%
Raman scattering
24%
Sheet resistance
23%
Temperature
13%
Chemical Compounds
Graphene
31%
Graphite
49%
Intercalation Compound
58%
Liquid Film
10%
Molybdenum Pentachloride
39%
Multilayer
19%
Nitrogen
13%
Percent Reduction
26%
Raman Spectrum
18%
Sheet Resistance
26%
Strain
15%
Time
16%