Abstract
Diamond-like carbon (DLC) coating via PVD/CVD on the SKD11 substrate was employed to make micro-texturing by using high density oxygen plasma etching. Original pattern by metal chromium was first line-drawn on the surface of DLC coating; then, it was subjected to oxygen plasma etching. Even without any hazardous etchants such as CF4, high etching rate was attained only by using oxygen gas; i.e. 5μm/H. Plasma diagnosis by spectroscopy proved that this etching process should be controlled by activated oxygen atom flux of {O, O*}. Direct chemical reaction by C (in DLC)+O→CO, or, C (in DLC)+O*→CO, drove this etching process. Detection of CO peaks in the wave length range from 200 to 300nm also proved that this oxygen plasma etching should be advanced by chemical reactions. This etching behavior was insensitive to line width (WG) and pitch width (PG) for 2μm<WG<100μm and 5μm<PG<100μm. Scanning electron microscope and laser-profilometer were also used to make precise measurement on the etched profiles.
| Original language | English |
|---|---|
| Pages (from-to) | 364-368 |
| Number of pages | 5 |
| Journal | Surface and Coatings Technology |
| Volume | 215 |
| DOIs | |
| Publication status | Published - 2013 Jan 25 |
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Keywords
- DLC
- Masking
- Micro-grooving
- Oxygen plasma etching
- Plasma diagnosis
- RF-DC plasmas
ASJC Scopus subject areas
- Chemistry(all)
- Condensed Matter Physics
- Materials Chemistry
- Surfaces, Coatings and Films
- Surfaces and Interfaces
Cite this
Oxygen plasma etching of diamond-like carbon coated mold-die for micro-texturing. / Aizawa, Tatsuhiko; Fukuda, Tatsuya.
In: Surface and Coatings Technology, Vol. 215, 25.01.2013, p. 364-368.Research output: Contribution to journal › Article
}
TY - JOUR
T1 - Oxygen plasma etching of diamond-like carbon coated mold-die for micro-texturing
AU - Aizawa, Tatsuhiko
AU - Fukuda, Tatsuya
PY - 2013/1/25
Y1 - 2013/1/25
N2 - Diamond-like carbon (DLC) coating via PVD/CVD on the SKD11 substrate was employed to make micro-texturing by using high density oxygen plasma etching. Original pattern by metal chromium was first line-drawn on the surface of DLC coating; then, it was subjected to oxygen plasma etching. Even without any hazardous etchants such as CF4, high etching rate was attained only by using oxygen gas; i.e. 5μm/H. Plasma diagnosis by spectroscopy proved that this etching process should be controlled by activated oxygen atom flux of {O, O*}. Direct chemical reaction by C (in DLC)+O→CO, or, C (in DLC)+O*→CO, drove this etching process. Detection of CO peaks in the wave length range from 200 to 300nm also proved that this oxygen plasma etching should be advanced by chemical reactions. This etching behavior was insensitive to line width (WG) and pitch width (PG) for 2μm<WG<100μm and 5μm<PG<100μm. Scanning electron microscope and laser-profilometer were also used to make precise measurement on the etched profiles.
AB - Diamond-like carbon (DLC) coating via PVD/CVD on the SKD11 substrate was employed to make micro-texturing by using high density oxygen plasma etching. Original pattern by metal chromium was first line-drawn on the surface of DLC coating; then, it was subjected to oxygen plasma etching. Even without any hazardous etchants such as CF4, high etching rate was attained only by using oxygen gas; i.e. 5μm/H. Plasma diagnosis by spectroscopy proved that this etching process should be controlled by activated oxygen atom flux of {O, O*}. Direct chemical reaction by C (in DLC)+O→CO, or, C (in DLC)+O*→CO, drove this etching process. Detection of CO peaks in the wave length range from 200 to 300nm also proved that this oxygen plasma etching should be advanced by chemical reactions. This etching behavior was insensitive to line width (WG) and pitch width (PG) for 2μm<WG<100μm and 5μm<PG<100μm. Scanning electron microscope and laser-profilometer were also used to make precise measurement on the etched profiles.
KW - DLC
KW - Masking
KW - Micro-grooving
KW - Oxygen plasma etching
KW - Plasma diagnosis
KW - RF-DC plasmas
UR - http://www.scopus.com/inward/record.url?scp=84872682579&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=84872682579&partnerID=8YFLogxK
U2 - 10.1016/j.surfcoat.2012.07.095
DO - 10.1016/j.surfcoat.2012.07.095
M3 - Article
AN - SCOPUS:84872682579
VL - 215
SP - 364
EP - 368
JO - Surface and Coatings Technology
JF - Surface and Coatings Technology
SN - 0257-8972
ER -