Paramagnetic centers induced by ArF excimer laser irradiation in high-purity silica glasses

Hiroyuki Nishikawa, R. Nakamura, R. Tohmon, Y. Ohki, Y. Hama, Y. Sakurai, K. Nagasawa

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

High-purity silica glasses prepared by various manufacturing methods were investigated after irradiation with an ArF excimer laser. Defect species and concentrations were found to be dependent on oxygen stoichiometry and impurities: E′ centers are induced in oxygen-deficient high-OH silica at concentrations of 10 16/cm 3, while at one or two orders of lower concentrations in other types of samples. Defect centers in γ-irradiated silicas studied for comparison, show a similar dependency on oxygen stoichiometry and impurities. In addition, O 2 - ions are observed in oxygen-surplus samples after γ-irradiation, which were created presumably by the trapping of free electrons. Isochronal annealing experiments indicate that the annealing of E′ centers in ArF-laser irradiated samples are due to the diffusion of O 2 and H 2O.

Original languageEnglish
Title of host publicationProceedings of SPIE - The International Society for Optical Engineering
EditorsAlexander J.III. Marker
PublisherPubl by Int Soc for Optical Engineering
Pages69-78
Number of pages10
Volume1327
Publication statusPublished - 1990
Externally publishedYes
EventProperties and Characteristics of Optical Glass II - San Diego, CA, USA
Duration: 1990 Jul 121990 Jul 13

Other

OtherProperties and Characteristics of Optical Glass II
CitySan Diego, CA, USA
Period90/7/1290/7/13

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ASJC Scopus subject areas

  • Electrical and Electronic Engineering
  • Condensed Matter Physics

Cite this

Nishikawa, H., Nakamura, R., Tohmon, R., Ohki, Y., Hama, Y., Sakurai, Y., & Nagasawa, K. (1990). Paramagnetic centers induced by ArF excimer laser irradiation in high-purity silica glasses. In A. J. III. Marker (Ed.), Proceedings of SPIE - The International Society for Optical Engineering (Vol. 1327, pp. 69-78). Publ by Int Soc for Optical Engineering.