Permalloy nanostructures for magneto-impedance measurements

S. Getlawi, M. König, H. Gao, Michael Rudolf Koblischka, U. Hartmann

Research output: Contribution to journalConference article

Abstract

The magneto-impedance (MI) effect attracts an increasing interest due to its high value in comparison to magnetic resistance (MR) effects, opening possible applications as e.g., high-sensitivity magnetic field detectors, magnetic recording heads, etc. However, for most samples employed in MI measurements in the literature, i.e., amorphous wires, magnetic multilayers and ribbons, the real three-dimensional domain structure remains unknown. In order to find the relation between the magnetic domain structure and the respective value of the MI effect, permalloy (Ni81Fe19) nanowires and thin films were produced by electron-beam lithography (EBL), lift-off technique and focused ion beam (FIB) milling. Wires and other structures (rectangles, circles), and domain pinning sites (notches) were manufactured with optimized dimension (size, thickness, etc.). The magnetic structure of our samples and the MI effects were analyzed by magnetic force microscopy and transport measurements.

Original languageEnglish
Article number072031
JournalJournal of Physics: Conference Series
Volume200
Issue numberSECTION 7
DOIs
Publication statusPublished - 2010 Jan 1
Externally publishedYes

Fingerprint

impedance measurement
Permalloys (trademark)
impedance
wire
recording heads
magnetic force microscopy
rectangles
magnetic recording
notches
magnetic domains
ribbons
nanowires
lithography
ion beams
electron beams
sensitivity
detectors
thin films
magnetic fields

ASJC Scopus subject areas

  • Physics and Astronomy(all)

Cite this

Permalloy nanostructures for magneto-impedance measurements. / Getlawi, S.; König, M.; Gao, H.; Koblischka, Michael Rudolf; Hartmann, U.

In: Journal of Physics: Conference Series, Vol. 200, No. SECTION 7, 072031, 01.01.2010.

Research output: Contribution to journalConference article

Getlawi, S. ; König, M. ; Gao, H. ; Koblischka, Michael Rudolf ; Hartmann, U. / Permalloy nanostructures for magneto-impedance measurements. In: Journal of Physics: Conference Series. 2010 ; Vol. 200, No. SECTION 7.
@article{cd258ff632434424a12e2177de295006,
title = "Permalloy nanostructures for magneto-impedance measurements",
abstract = "The magneto-impedance (MI) effect attracts an increasing interest due to its high value in comparison to magnetic resistance (MR) effects, opening possible applications as e.g., high-sensitivity magnetic field detectors, magnetic recording heads, etc. However, for most samples employed in MI measurements in the literature, i.e., amorphous wires, magnetic multilayers and ribbons, the real three-dimensional domain structure remains unknown. In order to find the relation between the magnetic domain structure and the respective value of the MI effect, permalloy (Ni81Fe19) nanowires and thin films were produced by electron-beam lithography (EBL), lift-off technique and focused ion beam (FIB) milling. Wires and other structures (rectangles, circles), and domain pinning sites (notches) were manufactured with optimized dimension (size, thickness, etc.). The magnetic structure of our samples and the MI effects were analyzed by magnetic force microscopy and transport measurements.",
author = "S. Getlawi and M. K{\"o}nig and H. Gao and Koblischka, {Michael Rudolf} and U. Hartmann",
year = "2010",
month = "1",
day = "1",
doi = "10.1088/1742-6596/200/7/072031",
language = "English",
volume = "200",
journal = "Journal of Physics: Conference Series",
issn = "1742-6588",
publisher = "IOP Publishing Ltd.",
number = "SECTION 7",

}

TY - JOUR

T1 - Permalloy nanostructures for magneto-impedance measurements

AU - Getlawi, S.

AU - König, M.

AU - Gao, H.

AU - Koblischka, Michael Rudolf

AU - Hartmann, U.

PY - 2010/1/1

Y1 - 2010/1/1

N2 - The magneto-impedance (MI) effect attracts an increasing interest due to its high value in comparison to magnetic resistance (MR) effects, opening possible applications as e.g., high-sensitivity magnetic field detectors, magnetic recording heads, etc. However, for most samples employed in MI measurements in the literature, i.e., amorphous wires, magnetic multilayers and ribbons, the real three-dimensional domain structure remains unknown. In order to find the relation between the magnetic domain structure and the respective value of the MI effect, permalloy (Ni81Fe19) nanowires and thin films were produced by electron-beam lithography (EBL), lift-off technique and focused ion beam (FIB) milling. Wires and other structures (rectangles, circles), and domain pinning sites (notches) were manufactured with optimized dimension (size, thickness, etc.). The magnetic structure of our samples and the MI effects were analyzed by magnetic force microscopy and transport measurements.

AB - The magneto-impedance (MI) effect attracts an increasing interest due to its high value in comparison to magnetic resistance (MR) effects, opening possible applications as e.g., high-sensitivity magnetic field detectors, magnetic recording heads, etc. However, for most samples employed in MI measurements in the literature, i.e., amorphous wires, magnetic multilayers and ribbons, the real three-dimensional domain structure remains unknown. In order to find the relation between the magnetic domain structure and the respective value of the MI effect, permalloy (Ni81Fe19) nanowires and thin films were produced by electron-beam lithography (EBL), lift-off technique and focused ion beam (FIB) milling. Wires and other structures (rectangles, circles), and domain pinning sites (notches) were manufactured with optimized dimension (size, thickness, etc.). The magnetic structure of our samples and the MI effects were analyzed by magnetic force microscopy and transport measurements.

UR - http://www.scopus.com/inward/record.url?scp=77957053071&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=77957053071&partnerID=8YFLogxK

U2 - 10.1088/1742-6596/200/7/072031

DO - 10.1088/1742-6596/200/7/072031

M3 - Conference article

VL - 200

JO - Journal of Physics: Conference Series

JF - Journal of Physics: Conference Series

SN - 1742-6588

IS - SECTION 7

M1 - 072031

ER -