Photo-electrochemical deposition of platinum on TiO2 with resolution of twenty nanometers using a mask elaborated with electron-beam lithography

Saulius Juodkazis, Akira Yamaguchi, Hidekazu Ishii, Shigeki Matsuo, Hitoshi Takagi, Hiroaki Misawa

Research output: Contribution to journalArticle

11 Citations (Scopus)

Abstract

We report the patterning of Pt on a TiO2-rutile single crystal (the fundamental absorption band starts at 396 nm) by direct deposition from a water solution of H2PtCl6 (10-20 mmol/dm3) using laser beam writing at 390-396 nm, or by Hg-lamp illumination (i-line at 365 nm). Pt deposition was corroborated by microchemical analysis. A resolution of the Pt pattern down to 20-30 nm was achieved. To create a Pt pattern with resolution of twenty nanometers, we employed a mask elaborated with electron-beam (EB) drawing lithography. The mask was transparent to the writing illumination. The Pt was reduced from the solution by laser scanning over resist-covered regions, while the pattern was formed in the openings of the resist. Separation of the growth and illumination regions, typically, by 0.5-2 μm, facilitates the deposition of reproducible, high-aspect-ratio patterns. It is demonstrated that Pt was deposited through a process of diffusion on the light-excited carriers. The possibility of fabrication of a three-dimensional Pt pattern by the overgrowth of the resist is discussed.

Original languageEnglish
Pages (from-to)4246-4251
Number of pages6
JournalJapanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers
Volume40
Issue number6 A
Publication statusPublished - 2001 Jun
Externally publishedYes

Fingerprint

Electron beam lithography
Masks
Platinum
platinum
masks
lithography
Lighting
electron beams
illumination
Electric lamps
Lithography
Laser beams
Aspect ratio
Absorption spectra
Electron beams
Single crystals
Scanning
Fabrication
high aspect ratio
Lasers

Keywords

  • Laser-assisted deposition
  • Microfabrication
  • Platinum
  • Titania

ASJC Scopus subject areas

  • Physics and Astronomy (miscellaneous)

Cite this

Photo-electrochemical deposition of platinum on TiO2 with resolution of twenty nanometers using a mask elaborated with electron-beam lithography. / Juodkazis, Saulius; Yamaguchi, Akira; Ishii, Hidekazu; Matsuo, Shigeki; Takagi, Hitoshi; Misawa, Hiroaki.

In: Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers, Vol. 40, No. 6 A, 06.2001, p. 4246-4251.

Research output: Contribution to journalArticle

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