Photoluminescence and electron spin-resonance studies of defects in ion-implanted thermal SiO2 films

H. Nishikawa, H. Fukui, E. Watanabe, D. Ito, M. Takiyamal, A. Ieki, Y. Ohki

Research output: Contribution to journal › Article › peer-review

Cite this

@article{77cbda2e3f8f4d3e988a994f10166d22,

title = "Photoluminescence and electron spin-resonance studies of defects in ion-implanted thermal SiO2 films",

author = "H. Nishikawa and H. Fukui and E. Watanabe and D. Ito and M. Takiyamal and A. Ieki and Y. Ohki",

year = "1995",

month = jan,

day = "1",

language = "English",

volume = "196-201",

pages = "97--102",

journal = "Materials Science Forum",

issn = "0255-5476",

publisher = "Trans Tech Publications",

}

TY - JOUR

T1 - Photoluminescence and electron spin-resonance studies of defects in ion-implanted thermal SiO2 films

AU - Nishikawa, H.

AU - Fukui, H.

AU - Watanabe, E.

AU - Ito, D.

AU - Takiyamal, M.

AU - Ieki, A.

AU - Ohki, Y.

PY - 1995/1/1

Y1 - 1995/1/1

M3 - Article

VL - 196-201

SP - 97

EP - 102

JO - Materials Science Forum

JF - Materials Science Forum

SN - 0255-5476

ER -