Photoluminescence study of defect in ion-implanted thermal SiO2 films

H. Nishikawa, E. Watanabe, D. Ito, M. Takiyama, A.Ieki A.Ieki, Y. Ohki

Research output: Contribution to journalArticle

79 Citations (Scopus)
Original languageEnglish
Pages (from-to)842-846
JournalDefault journal
Volume78
Publication statusPublished - 1995 Jul 1

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Nishikawa, H., Watanabe, E., Ito, D., Takiyama, M., A.Ieki, A. I., & Ohki, Y. (1995). Photoluminescence study of defect in ion-implanted thermal SiO2 films. Default journal, 78, 842-846.