Photoluminescence Study on Point Defects in SIMOX Buried SiO2 Film

K. S.Seol, A. Ieki, Y. Ohki, H. Nishikawa, M. Tachimori

Research output: Contribution to journalArticle

Original languageEnglish
Pages (from-to)1909-1914
JournalMaterials Science Forum
Volume196-201
Publication statusPublished - 1995 Jan 1

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S.Seol, K., Ieki, A., Ohki, Y., Nishikawa, H., & Tachimori, M. (1995). Photoluminescence Study on Point Defects in SIMOX Buried SiO2 Film. Materials Science Forum, 196-201, 1909-1914.