Photopatterning of tantalum oxide films by a sol-gel method using a KrF excimer laser

Tomoji Ohishi, A. Katoh

Research output: Contribution to journalArticle

10 Citations (Scopus)

Abstract

A photopatterning process for tantalum oxide films prepared by a sol-gel method was studied using a KrF excimer laser. A fine pattern photomask was attached to the tantalum oxide films which are irradiated with the KrF excimer laser and subsequently etched with hydrofluoric acid. Those area of the films irradiated with the laser were to etched leaving a line pattern of tantalum oxide film on the substrates. The state of the fine pattern depended on the intensity and pulse number of the laser. Fine patterns with a 10 μ m width were fabricated by laser irradiation of 75 mJ cm-2 intensity.

Original languageEnglish
Pages (from-to)79-80
Number of pages2
JournalBritish Ceramic Transactions
Volume92
Issue number2
Publication statusPublished - 1993
Externally publishedYes

Fingerprint

Tantalum oxides
Excimer lasers
Sol-gel process
Oxide films
Hydrofluoric Acid
Photomasks
Hydrofluoric acid
Lasers
Laser beam effects
Laser pulses
Substrates
tantalum oxide

ASJC Scopus subject areas

  • Ceramics and Composites

Cite this

Photopatterning of tantalum oxide films by a sol-gel method using a KrF excimer laser. / Ohishi, Tomoji; Katoh, A.

In: British Ceramic Transactions, Vol. 92, No. 2, 1993, p. 79-80.

Research output: Contribution to journalArticle

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