Physical properties of bi4ti3o12films grown on si(100) wafers

Masaki Yamaguchi, Takao Nagatomo, Osamu Omoto

Research output: Contribution to journalArticle

12 Citations (Scopus)

Abstract

Bismuth titanate (Bi4Ti3O12) films were prepared on Si(100) wafers by rf planar magnetron sputtering using a target of Bi2TiO5 ceramic. C-axis-oriented Bi4Ti3O12 films were grown on Si(100) at a low substrate temperature of 550ŶC. However, thesefilms did not exhibit ferroelectricity, and the dielectricconstant ॉrand dissipation factor tan ै were about 156 and 0.032, respectively. The dielectric constant was reduced with decreasing film thickness. This behavior was assuming supposing a low-dielectric-constant interface layer. These films showed the dielectric breakdown field of about 21ŠkV/cm.

Original languageEnglish
Pages (from-to)5116-5119
Number of pages4
JournalJapanese Journal of Applied Physics
Volume34
Issue number9
DOIs
Publication statusPublished - 1995 Sep

Keywords

  • BiTiO
  • C-axis orientation
  • Rf planar magnetron sputtering
  • Thickness dependance
  • Thin films

ASJC Scopus subject areas

  • Engineering(all)
  • Physics and Astronomy(all)

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