Physical simulation and visualization of the Marangoni convection inside meniscus region under IPA vapor in wafer drying process

N. Ono, T. Yamada, S. Miura, T. Ishibashi, H. Matsuo, K. Watanabe

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

In cleaning and drying processes after chemical mechanical polishing process, there is a method of flowing pure water to a rotating wafer, and simultaneously supplying IPA (Iso-Propyl Alcohol) vapor to the meniscus region (this is known as Rotagoni drying). This method causes a surface tension difference on the liquid surface and then drives fluid convection by the Marangoni effect, which is thought to efficiently remove impure particles on the wafer surface. During the impingement of IPA vapor to the meniscus region, in-situ observation of Marangoni convection is technically difficult. In this study, physical simulation by creating a simplified two-dimensional flow was performed. Using MEMS device technique, a two-dimensional flow channel was created, and pure water and IPA vapor was supplied to reproduce the situation, and the flow was visualized by utilizing PIV (Particle Image Velocimetry) method. The flow velocities and the flow patterns were successfully obtained from the image analysis. The surface flow with IPA vapor was in the reversed direction of that with only nitrogen gas, and the velocity became larger.

Original languageEnglish
Title of host publication16th International Symposium on Semiconductor Cleaning Science and Technology, SCST 2019
EditorsKoichiro Saga, Paul W. Mertens, Takeshi Hattori, Jerzy Ruzyllo, Anthony J. Muscat
PublisherElectrochemical Society Inc.
Pages107-116
Number of pages10
Edition2
ISBN (Electronic)9781607685395
DOIs
Publication statusPublished - 2019
Event16th International Symposium on Semiconductor Cleaning Science and Technology, SCST 2019 - 236th ECS Meeting - Atlanta, United States
Duration: 2019 Oct 132019 Oct 17

Publication series

NameECS Transactions
Number2
Volume92
ISSN (Print)1938-6737
ISSN (Electronic)1938-5862

Conference

Conference16th International Symposium on Semiconductor Cleaning Science and Technology, SCST 2019 - 236th ECS Meeting
CountryUnited States
CityAtlanta
Period19/10/1319/10/17

ASJC Scopus subject areas

  • Engineering(all)

Fingerprint Dive into the research topics of 'Physical simulation and visualization of the Marangoni convection inside meniscus region under IPA vapor in wafer drying process'. Together they form a unique fingerprint.

  • Cite this

    Ono, N., Yamada, T., Miura, S., Ishibashi, T., Matsuo, H., & Watanabe, K. (2019). Physical simulation and visualization of the Marangoni convection inside meniscus region under IPA vapor in wafer drying process. In K. Saga, P. W. Mertens, T. Hattori, J. Ruzyllo, & A. J. Muscat (Eds.), 16th International Symposium on Semiconductor Cleaning Science and Technology, SCST 2019 (2 ed., pp. 107-116). (ECS Transactions; Vol. 92, No. 2). Electrochemical Society Inc.. https://doi.org/10.1149/09202.0107ecst