| Original language | English |
|---|---|
| Pages (from-to) | 17-24 |
| Journal | Memoirs of Faculty of Engineering |
| Publication status | Published - 1996 Jan 1 |
Plasma-induced damage of silicon thermal oxides in the VLSI process
H. Nishikawa, E. Watanabe, D. Ito, F. Tochikubo
Research output: Contribution to journal › Article › peer-review