Plasma-induced damage of silicon thermal oxides in the VLSI process

H. Nishikawa, E. Watanabe, D. Ito, F. Tochikubo

Research output: Contribution to journalArticle

Original languageEnglish
Pages (from-to)17-24
JournalMemoirs of Faculty of Engineering
Publication statusPublished - 1996 Jan 1

Cite this

Plasma-induced damage of silicon thermal oxides in the VLSI process. / Nishikawa, H.; Watanabe, E.; Ito, D.; Tochikubo, F.

In: Memoirs of Faculty of Engineering, 01.01.1996, p. 17-24.

Research output: Contribution to journalArticle

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