Plasma polymerization of silicon-containing monomers

Zainal Abidin Talib, Shigeru Kurosawa, Björn Atthoff, Hidenobu Aizawa, Kazuya Kashima, Tomoya Hirokawa, Yasuo Yoshimi, Minoru Yoshimoto, Toshihiro Hirotsu, Jun Miyake, Jöns Hilborn

Research output: Contribution to journalArticle

3 Citations (Scopus)

Abstract

Plasma depositions of ultra thin films from seven silicon-containing liquid monomers were investigated using a continuos wave (CW) plasma source. The deposition rate of plasma polymerized films were determined using a quartz crystal microbalance (QCM) technique while the film composition were determined spectroscopiclly using primarily X-ray photoelectron spectroscopy (XPS) and Fourier transform infrared method (FT-IR). The wettability of the plasma-polymerized films was also investigated by measuring the contact angles of water on the film surfaces. It was observed that the C=C absorption band was not present in these films. This observation is consistent with selective polymerization through the double bond. Oxygen was present in all samples investigated and this may be attributed to the quenching of radicals in the film by reactions with oxygen when exposed to atmosphere.

Original languageEnglish
Pages (from-to)129-138
Number of pages10
JournalJournal of Photopolymer Science and Technology
Volume14
Issue number1
Publication statusPublished - 2001

Fingerprint

Plasma polymerization
Silicon
Monomers
Oxygen
Plasmas
Plasma deposition
Plasma sources
Ultrathin films
Quartz crystal microbalances
Deposition rates
Contact angle
Wetting
Absorption spectra
Quenching
Fourier transforms
X ray photoelectron spectroscopy
Polymerization
Infrared radiation
Water
Liquids

Keywords

  • Deposition rate
  • Plasma polymerization
  • Quartz crystal microbalance (QCM)
  • Silicon-containing monomers
  • XPS

ASJC Scopus subject areas

  • Polymers and Plastics
  • Materials Chemistry

Cite this

Talib, Z. A., Kurosawa, S., Atthoff, B., Aizawa, H., Kashima, K., Hirokawa, T., ... Hilborn, J. (2001). Plasma polymerization of silicon-containing monomers. Journal of Photopolymer Science and Technology, 14(1), 129-138.

Plasma polymerization of silicon-containing monomers. / Talib, Zainal Abidin; Kurosawa, Shigeru; Atthoff, Björn; Aizawa, Hidenobu; Kashima, Kazuya; Hirokawa, Tomoya; Yoshimi, Yasuo; Yoshimoto, Minoru; Hirotsu, Toshihiro; Miyake, Jun; Hilborn, Jöns.

In: Journal of Photopolymer Science and Technology, Vol. 14, No. 1, 2001, p. 129-138.

Research output: Contribution to journalArticle

Talib, ZA, Kurosawa, S, Atthoff, B, Aizawa, H, Kashima, K, Hirokawa, T, Yoshimi, Y, Yoshimoto, M, Hirotsu, T, Miyake, J & Hilborn, J 2001, 'Plasma polymerization of silicon-containing monomers', Journal of Photopolymer Science and Technology, vol. 14, no. 1, pp. 129-138.
Talib ZA, Kurosawa S, Atthoff B, Aizawa H, Kashima K, Hirokawa T et al. Plasma polymerization of silicon-containing monomers. Journal of Photopolymer Science and Technology. 2001;14(1):129-138.
Talib, Zainal Abidin ; Kurosawa, Shigeru ; Atthoff, Björn ; Aizawa, Hidenobu ; Kashima, Kazuya ; Hirokawa, Tomoya ; Yoshimi, Yasuo ; Yoshimoto, Minoru ; Hirotsu, Toshihiro ; Miyake, Jun ; Hilborn, Jöns. / Plasma polymerization of silicon-containing monomers. In: Journal of Photopolymer Science and Technology. 2001 ; Vol. 14, No. 1. pp. 129-138.
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AU - Hirokawa, Tomoya

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