Plasma polymerization of silicon-containing monomers

Zainal Abidin Talib, Shigeru Kurosawa, Björn Atthoff, Hidenobu Aizawa, Kazuya Kashima, Tomoya Hirokawa, Yasuo Yoshimi, Minoru Yoshimoto, Toshihiro Hirotsu, Jun Miyake, Jöns Hilborn

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3 Citations (Scopus)

Abstract

Plasma depositions of ultra thin films from seven silicon-containing liquid monomers were investigated using a continuos wave (CW) plasma source. The deposition rate of plasma polymerized films were determined using a quartz crystal microbalance (QCM) technique while the film composition were determined spectroscopiclly using primarily X-ray photoelectron spectroscopy (XPS) and Fourier transform infrared method (FT-IR). The wettability of the plasma-polymerized films was also investigated by measuring the contact angles of water on the film surfaces. It was observed that the C=C absorption band was not present in these films. This observation is consistent with selective polymerization through the double bond. Oxygen was present in all samples investigated and this may be attributed to the quenching of radicals in the film by reactions with oxygen when exposed to atmosphere.

Original languageEnglish
Pages (from-to)129-138
Number of pages10
JournalJournal of Photopolymer Science and Technology
Volume14
Issue number1
DOIs
Publication statusPublished - 2001 Jan 1

Keywords

  • Deposition rate
  • Plasma polymerization
  • Quartz crystal microbalance (QCM)
  • Silicon-containing monomers
  • XPS

ASJC Scopus subject areas

  • Polymers and Plastics
  • Organic Chemistry
  • Materials Chemistry

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  • Cite this

    Talib, Z. A., Kurosawa, S., Atthoff, B., Aizawa, H., Kashima, K., Hirokawa, T., Yoshimi, Y., Yoshimoto, M., Hirotsu, T., Miyake, J., & Hilborn, J. (2001). Plasma polymerization of silicon-containing monomers. Journal of Photopolymer Science and Technology, 14(1), 129-138. https://doi.org/10.2494/photopolymer.14.129