Post-deposition processes for nanostructures formed by electron beam induced deposition with Pt(PF3)4 precursor

M. Takeguchi, Masayuki Shimojo, K. Furuya

Research output: Contribution to journalArticle

15 Citations (Scopus)

Abstract

Electron beam induced deposition was performed using a Pt(PF 3)4 precursor gas. Self-standing nanowires were produced on the edge of a molybdenum film, followed by two post-deposition processes; electron beam irradiation at room temperature and heating at about 400 K in vacuum. The as-deposited nanowires were composed of an amorphous phase, of which the dominant composition was platinum but containing a small amount of phosphorus impurity. After irradiating with a 300 keV electron beam, the amorphous nanowires were transformed to crystalline ones. By heating, the as-deposited nanowires became single-crystal platinum with a large grain size and the phosphorus content disappeared.

Original languageEnglish
Pages (from-to)439-442
Number of pages4
JournalApplied Physics A: Materials Science and Processing
Volume93
Issue number2
DOIs
Publication statusPublished - 2008 Nov
Externally publishedYes

Fingerprint

Nanowires
Electron beams
Nanostructures
nanowires
electron beams
Platinum
Phosphorus
phosphorus
platinum
Platelet Factor 3
Heating
heating
Molybdenum
molybdenum
grain size
Gases
Irradiation
Single crystals
Vacuum
Impurities

ASJC Scopus subject areas

  • Materials Science(all)
  • Physics and Astronomy (miscellaneous)

Cite this

Post-deposition processes for nanostructures formed by electron beam induced deposition with Pt(PF3)4 precursor. / Takeguchi, M.; Shimojo, Masayuki; Furuya, K.

In: Applied Physics A: Materials Science and Processing, Vol. 93, No. 2, 11.2008, p. 439-442.

Research output: Contribution to journalArticle

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