Preparation and characterization of highly c-axis-oriented Bi4Ti3O12 thin films

Masaki Yamaguchi, Kensuke Kawanabe, Takao Nagatomo, Osamu Omoto

Research output: Contribution to journalArticle

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Abstract

Highly c-axis-oriented bismuth titanate (Bi4Ti3O12) thin films were prepared on (100)-oriented silicon wafers by rf planar magnetron sputtering using a target of Bi2TiO5 ceramic at a low substrate temperature of 600°C. The films with a c-axis orientation up to 99% were obtained under high deposition rate approximately 1.1 μm h 1. Dielectric constant of these films were dependence of film thickness. This behavior was explained assuming a low-dielectric-constant interface layer. Using this assumption, the dielectric constant of Bi4Ti3O12 film was estimated to be approximately 140. This value is similar to that along the c-axis in a bulk form. A D E hysteresis characteristic has been observed at room temperature. The remanent polarization and the coercive field are 0.8 μC cm 2 and 20 k V cm 1, respectively. From analysis of refractive index, interface layer was confirmed an oxidized silicon, which was formed before and/or during film deposition.

Original languageEnglish
Pages (from-to)138-142
Number of pages5
JournalMaterials Science and Engineering B
Volume41
Issue number1
DOIs
Publication statusPublished - 1996 Oct

Fingerprint

Thin films
preparation
Permittivity
permittivity
thin films
Remanence
silicon
Silicon
Deposition rates
Bismuth
Silicon wafers
Magnetron sputtering
bismuth
Film thickness
Hysteresis
Refractive index
magnetron sputtering
film thickness
hysteresis
wafers

Keywords

  • Crystalline structure
  • Dielectric properties
  • Refractive index

ASJC Scopus subject areas

  • Materials Science(all)
  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics

Cite this

Preparation and characterization of highly c-axis-oriented Bi4Ti3O12 thin films. / Yamaguchi, Masaki; Kawanabe, Kensuke; Nagatomo, Takao; Omoto, Osamu.

In: Materials Science and Engineering B, Vol. 41, No. 1, 10.1996, p. 138-142.

Research output: Contribution to journalArticle

Yamaguchi, Masaki ; Kawanabe, Kensuke ; Nagatomo, Takao ; Omoto, Osamu. / Preparation and characterization of highly c-axis-oriented Bi4Ti3O12 thin films. In: Materials Science and Engineering B. 1996 ; Vol. 41, No. 1. pp. 138-142.
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