Preparation and gas barrier characteristics of polysilazane-derived silica thin films using ultraviolet irradiation

Tomoji Ohishi, S. Sone, K Yanagida

Research output: Contribution to journalArticle

Original languageEnglish
Pages (from-to)105-111
Number of pages7
JournalScientific Reports
Volume5
Publication statusPublished - 2014

Cite this

Preparation and gas barrier characteristics of polysilazane-derived silica thin films using ultraviolet irradiation. / Ohishi, Tomoji; Sone, S.; Yanagida, K.

In: Scientific Reports, Vol. 5, 2014, p. 105-111.

Research output: Contribution to journalArticle

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title = "Preparation and gas barrier characteristics of polysilazane-derived silica thin films using ultraviolet irradiation",
author = "Tomoji Ohishi and S. Sone and K Yanagida",
year = "2014",
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journal = "Scientific Reports",
issn = "2045-2322",
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AU - Ohishi, Tomoji

AU - Sone, S.

AU - Yanagida, K

PY - 2014

Y1 - 2014

M3 - Article

VL - 5

SP - 105

EP - 111

JO - Scientific Reports

JF - Scientific Reports

SN - 2045-2322

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