Preparation and properties of anti-reflection/anti-static thin films formed on organic film by photo-assisted sol-gel method

T. Ohishi

doi:10.1016/j.jnoncrysol.2003.09.019

Preparation and properties of anti-reflection/anti-static thin films formed on organic film by photo-assisted sol-gel method

T. Ohishi

Research output: Contribution to journal › Article

7 Citations (Scopus)

Abstract

With the objective of developing films for advanced systems, a photo-assisted sol-gel method has been used to form an anti-reflection/anti-static thin film on an organic film (PET) that has no heat-resistance, and the properties of the film have been evaluated. This method makes it possible to form a layered ITO/SiO₂ structure on the film at 60 °C, which is a good condition for such film formation. This film has a surface resistance of 2.0 × 10⁶ Ω/□ and a surface reflectivity of 0.35% (at 574 nm), which are good anti-reflection and anti-static properties for a thin film. Observation of the cross-sectional structure of the film by transmission electron microscope (TEM) reveals that the layer formed on the film is both flat and uniform.

Original language	English
Pages (from-to)	87-92
Number of pages	6
Journal	Journal of Non-Crystalline Solids
Volume	332
Issue number	1-3
DOIs	https://doi.org/10.1016/j.jnoncrysol.2003.09.019
Publication status	Published - 2003 Dec 15

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Ceramics and Composites
Condensed Matter Physics
Materials Chemistry

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10.1016/j.jnoncrysol.2003.09.019

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Ohishi, T. (2003). Preparation and properties of anti-reflection/anti-static thin films formed on organic film by photo-assisted sol-gel method. Journal of Non-Crystalline Solids, 332(1-3), 87-92. https://doi.org/10.1016/j.jnoncrysol.2003.09.019

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