A new technique for preparing anti-reflection/anti-static thin films for CRTs at low temperature has been developed. Double-layered films of SiO2/SnO2 were formed on a CRT panel surface by the sol-gel method using photoirradiation. The new method makes it possible to reduce heat treatment temperature (°C) by almost 50% and treatment time to approximately 33% of the conventional levels.
|Number of pages||5|
|Journal||Journal of Sol-Gel Science and Technology|
|Publication status||Published - 1997|
- Anti-reflection/anti-static film
- Sol-gel method
ASJC Scopus subject areas
- Ceramics and Composites