Preparation and Properties of Anti-Reflection/Anti-Static Thin Films for Cathode Ray Tubes Prepared by Sol-Gel Method Using Photoirradiation

Tomoji Ohishi, S. Maekawa, T. Ishikawa, D. Kamoto

Research output: Contribution to journalArticle

18 Citations (Scopus)

Abstract

A new technique for preparing anti-reflection/anti-static thin films for CRTs at low temperature has been developed. Double-layered films of SiO2/SnO2 were formed on a CRT panel surface by the sol-gel method using photoirradiation. The new method makes it possible to reduce heat treatment temperature (°C) by almost 50% and treatment time to approximately 33% of the conventional levels.

Original languageEnglish
Pages (from-to)511-515
Number of pages5
JournalJournal of Sol-Gel Science and Technology
Volume8
Issue number1-3
Publication statusPublished - 1997
Externally publishedYes

Fingerprint

cathode ray tubes
Cathode ray tubes
Sol-gel process
heat treatment
gels
Thin films
preparation
thin films
Heat treatment
Temperature
temperature

Keywords

  • Anti-reflection/anti-static film
  • Photoirradiation
  • Sol-gel method

ASJC Scopus subject areas

  • Ceramics and Composites

Cite this

Preparation and Properties of Anti-Reflection/Anti-Static Thin Films for Cathode Ray Tubes Prepared by Sol-Gel Method Using Photoirradiation. / Ohishi, Tomoji; Maekawa, S.; Ishikawa, T.; Kamoto, D.

In: Journal of Sol-Gel Science and Technology, Vol. 8, No. 1-3, 1997, p. 511-515.

Research output: Contribution to journalArticle

@article{55dacc3f41444ecd8bf1aa70c4844009,
title = "Preparation and Properties of Anti-Reflection/Anti-Static Thin Films for Cathode Ray Tubes Prepared by Sol-Gel Method Using Photoirradiation",
abstract = "A new technique for preparing anti-reflection/anti-static thin films for CRTs at low temperature has been developed. Double-layered films of SiO2/SnO2 were formed on a CRT panel surface by the sol-gel method using photoirradiation. The new method makes it possible to reduce heat treatment temperature (°C) by almost 50{\%} and treatment time to approximately 33{\%} of the conventional levels.",
keywords = "Anti-reflection/anti-static film, Photoirradiation, Sol-gel method",
author = "Tomoji Ohishi and S. Maekawa and T. Ishikawa and D. Kamoto",
year = "1997",
language = "English",
volume = "8",
pages = "511--515",
journal = "Journal of Sol-Gel Science and Technology",
issn = "0928-0707",
publisher = "Springer Netherlands",
number = "1-3",

}

TY - JOUR

T1 - Preparation and Properties of Anti-Reflection/Anti-Static Thin Films for Cathode Ray Tubes Prepared by Sol-Gel Method Using Photoirradiation

AU - Ohishi, Tomoji

AU - Maekawa, S.

AU - Ishikawa, T.

AU - Kamoto, D.

PY - 1997

Y1 - 1997

N2 - A new technique for preparing anti-reflection/anti-static thin films for CRTs at low temperature has been developed. Double-layered films of SiO2/SnO2 were formed on a CRT panel surface by the sol-gel method using photoirradiation. The new method makes it possible to reduce heat treatment temperature (°C) by almost 50% and treatment time to approximately 33% of the conventional levels.

AB - A new technique for preparing anti-reflection/anti-static thin films for CRTs at low temperature has been developed. Double-layered films of SiO2/SnO2 were formed on a CRT panel surface by the sol-gel method using photoirradiation. The new method makes it possible to reduce heat treatment temperature (°C) by almost 50% and treatment time to approximately 33% of the conventional levels.

KW - Anti-reflection/anti-static film

KW - Photoirradiation

KW - Sol-gel method

UR - http://www.scopus.com/inward/record.url?scp=0030653475&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0030653475&partnerID=8YFLogxK

M3 - Article

AN - SCOPUS:0030653475

VL - 8

SP - 511

EP - 515

JO - Journal of Sol-Gel Science and Technology

JF - Journal of Sol-Gel Science and Technology

SN - 0928-0707

IS - 1-3

ER -