Preparation and properties of SiO2 thin films by the sol-gel method using photoirradiation and its application to surface coating for display

Research output: Contribution to journalArticle

Original languageEnglish
Pages (from-to)421
JournalChemical Processing of Ceramics
Publication statusPublished - 2005

Cite this

@article{b48e6c98e049487eb4c6ac95336a3493,
title = "Preparation and properties of SiO2 thin films by the sol-gel method using photoirradiation and its application to surface coating for display",
author = "Tomoji Ohishi",
year = "2005",
language = "English",
pages = "421",
journal = "Chemical Processing of Ceramics",

}

TY - JOUR

T1 - Preparation and properties of SiO2 thin films by the sol-gel method using photoirradiation and its application to surface coating for display

AU - Ohishi, Tomoji

PY - 2005

Y1 - 2005

M3 - Article

SP - 421

JO - Chemical Processing of Ceramics

JF - Chemical Processing of Ceramics

ER -