Preparation and wear resistance of TiBC, TiBN, SiNx single layer film and TiBC-SiNx and TiBN-SiNx double layer film by thermal plasma CVD

Yusuke Fuji, Shiro Shimada, Hajime Kiyono

Research output: Contribution to journalArticlepeer-review

3 Citations (Scopus)


Monolithic (TiBC, TiBN, SiNx) and double layered films (TiBC-SiNx, TiBN-SiNx) were deposited on Si wafers or WC-Co substrates at about 800°C from a hexamethyldisiloxane, titanium tetra-ethoxide or tri-ethoxy borate solution and their mixed solution by thermal plasma chemical vapor deposition. The films were characterized by thin film X-raydiffractmetry (XRD), X-ray photoelectron spectroscopy, scanning electron microscopy, EDS analysis and the cutting tests. XRD indicated that TiBC and TiBN phases were crystalline, but SiNx was amorphous. Thickness of under-layered TiBC or TiBN and over-layered SiNx in the double layered films was 0.5 and 2-4μm, respectively. The cutting tests for the double layered film deposited on WC-Co showed that the double layered TiBC-SiNx and TiBN-SiNx films possessed the good wear resistance comparable to or higher than the commercial TiN film deposited on WC-Co prepared by thermal CVD, in terms of crater and flank wear resistances.

Original languageEnglish
Pages (from-to)287-293
Number of pages7
JournalFuntai Oyobi Fummatsu Yakin/Journal of the Japan Society of Powder and Powder Metallurgy
Issue number4
Publication statusPublished - 2007 Apr
Externally publishedYes


  • Alkoxide solution
  • Plasma-enhanced chemical vapor deposition
  • Wear resistance

ASJC Scopus subject areas

  • Mechanical Engineering
  • Industrial and Manufacturing Engineering
  • Metals and Alloys
  • Materials Chemistry


Dive into the research topics of 'Preparation and wear resistance of TiBC, TiBN, SiN<sub>x</sub> single layer film and TiBC-SiN<sub>x</sub> and TiBN-SiN<sub>x</sub> double layer film by thermal plasma CVD'. Together they form a unique fingerprint.

Cite this