Preparation of a stable silica using a counter diffusion chemical vapor deposition method

Mikihiro Nomura, Kenta Ono, SurajGopalakrishnan SurajGopalakrishnan, Takashi Sugawara, Shin-ichi Nakao

Research output: Contribution to journalArticle

Original languageEnglish
Pages (from-to)151-158
JournalJournal of Membrane Science
Volume251
Publication statusPublished - 2005 Apr 1

Cite this

Nomura, M., Ono, K., SurajGopalakrishnan, S., Sugawara, T., & Nakao, S. (2005). Preparation of a stable silica using a counter diffusion chemical vapor deposition method. Journal of Membrane Science, 251, 151-158.

Preparation of a stable silica using a counter diffusion chemical vapor deposition method. / Nomura, Mikihiro; Ono, Kenta; SurajGopalakrishnan, SurajGopalakrishnan; Sugawara, Takashi; Nakao, Shin-ichi.

In: Journal of Membrane Science, Vol. 251, 01.04.2005, p. 151-158.

Research output: Contribution to journalArticle

Nomura, M, Ono, K, SurajGopalakrishnan, S, Sugawara, T & Nakao, S 2005, 'Preparation of a stable silica using a counter diffusion chemical vapor deposition method', Journal of Membrane Science, vol. 251, pp. 151-158.
Nomura, Mikihiro ; Ono, Kenta ; SurajGopalakrishnan, SurajGopalakrishnan ; Sugawara, Takashi ; Nakao, Shin-ichi. / Preparation of a stable silica using a counter diffusion chemical vapor deposition method. In: Journal of Membrane Science. 2005 ; Vol. 251. pp. 151-158.
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