Preparation of a stable silica using a counter diffusion chemical vapor deposition method

Mikihiro Nomura, Kenta Ono, SurajGopalakrishnan SurajGopalakrishnan, Takashi Sugawara, Shin-ichi Nakao

Research output: Contribution to journalArticle

Original languageEnglish
Pages (from-to)151-158
JournalJournal of Membrane Science
Volume251
Publication statusPublished - 2005 Apr 1

Cite this

Nomura, M., Ono, K., SurajGopalakrishnan, S., Sugawara, T., & Nakao, S. (2005). Preparation of a stable silica using a counter diffusion chemical vapor deposition method. Journal of Membrane Science, 251, 151-158.