Preparation of a stable silica using a counter diffusion chemical vapor deposition method

Mikihiro Nomura, Kenta Ono, SurajGopalakrishnan SurajGopalakrishnan, Takashi Sugawara, Shin-ichi Nakao

Research output: Contribution to journal › Article › peer-review

Cite this

@article{b7e1841f03de4c90a62d5f92f6d900f0,

title = "Preparation of a stable silica using a counter diffusion chemical vapor deposition method",

author = "Mikihiro Nomura and Kenta Ono and SurajGopalakrishnan SurajGopalakrishnan and Takashi Sugawara and Shin-ichi Nakao",

year = "2005",

month = apr,

day = "1",

language = "English",

volume = "251",

pages = "151--158",

journal = "Jornal of Membrane Science",

issn = "0376-7388",

publisher = "Elsevier",

}

TY - JOUR

T1 - Preparation of a stable silica using a counter diffusion chemical vapor deposition method

AU - Nomura, Mikihiro

AU - Ono, Kenta

AU - SurajGopalakrishnan, SurajGopalakrishnan

AU - Sugawara, Takashi

AU - Nakao, Shin-ichi

PY - 2005/4/1

Y1 - 2005/4/1

M3 - Article

SN - 0376-7388

VL - 251

SP - 151

EP - 158

JO - Jornal of Membrane Science

JF - Jornal of Membrane Science

ER -