Preparation of an H2-permselective silica membrane for the separation of H2 from the hydrogen iodide decomposition reaction in the iodine–sulfur process

Odtsetseg Myagmarjav, Ayumi Ikeda, Nobuyuki Tanaka, Shinji Kubo, Mikihiro Nomura

Research output: Research - peer-reviewArticle

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Abstract

A high-performance, H2-permselective silica membrane derived from hexyltrimethoxysilane (HTMOS) was developed for application in the thermochemical water-splitting iodine–sulfur process. Silica membranes, referred to here as HTMOS membranes, were prepared via counter-diffusion chemical vapor deposition on γ-alumina-coated α-alumina support tubes with outer diameters of 10 mm. Special attention was devoted to obtain high H2/HI selectivity, high H2 permeance, and good stability in the presence of corrosive HI gas. The effects of the deposition conditions, temperature, and period were investigated. The HTMOS membrane prepared at 450 °C for 5 min exhibited high H2/HI selectivity (>175) with H2 permeance on the order of 10−7 mol Pa−1 m−2 s−1. On the basis of stability experiments, it was found that the HTMOS membrane was stable upon HI exposure at a temperature of 400 °C for 11 h.

LanguageEnglish
Pages6012-6023
Number of pages12
JournalInternational Journal of Hydrogen Energy
Volume42
Issue number9
DOIs
StatePublished - 2017 Mar 2

Fingerprint

iodides
iodine
sulfur
silicon dioxide
membranes
decomposition
preparation
hydrogen
Iodine
Sulfur
Silica
Decomposition
Membranes
Hydrogen
aluminum oxides
selectivity
temperature
Alumina
Temperature
water splitting

Keywords

  • Chemical vapor deposition
  • Hydrogen iodide decomposition
  • Silica membrane
  • Thermochemical hydrogen production

ASJC Scopus subject areas

  • Renewable Energy, Sustainability and the Environment
  • Fuel Technology
  • Condensed Matter Physics
  • Energy Engineering and Power Technology

Cite this

Preparation of an H2-permselective silica membrane for the separation of H2 from the hydrogen iodide decomposition reaction in the iodine–sulfur process. / Myagmarjav, Odtsetseg; Ikeda, Ayumi; Tanaka, Nobuyuki; Kubo, Shinji; Nomura, Mikihiro.

In: International Journal of Hydrogen Energy, Vol. 42, No. 9, 02.03.2017, p. 6012-6023.

Research output: Research - peer-reviewArticle

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abstract = "A high-performance, H2-permselective silica membrane derived from hexyltrimethoxysilane (HTMOS) was developed for application in the thermochemical water-splitting iodine–sulfur process. Silica membranes, referred to here as HTMOS membranes, were prepared via counter-diffusion chemical vapor deposition on γ-alumina-coated α-alumina support tubes with outer diameters of 10 mm. Special attention was devoted to obtain high H2/HI selectivity, high H2 permeance, and good stability in the presence of corrosive HI gas. The effects of the deposition conditions, temperature, and period were investigated. The HTMOS membrane prepared at 450 °C for 5 min exhibited high H2/HI selectivity (>175) with H2 permeance on the order of 10−7 mol Pa−1 m−2 s−1. On the basis of stability experiments, it was found that the HTMOS membrane was stable upon HI exposure at a temperature of 400 °C for 11 h.",
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AU - Kubo,Shinji

AU - Nomura,Mikihiro

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