Preparation of an H2-permselective silica membrane for the separation of H2 from the hydrogen iodide decomposition reaction in the iodine–sulfur process

Odtsetseg Myagmarjav, Ayumi Ikeda, Nobuyuki Tanaka, Shinji Kubo, Mikihiro Nomura

Research output: Contribution to journalArticle

12 Citations (Scopus)

Abstract

A high-performance, H2-permselective silica membrane derived from hexyltrimethoxysilane (HTMOS) was developed for application in the thermochemical water-splitting iodine–sulfur process. Silica membranes, referred to here as HTMOS membranes, were prepared via counter-diffusion chemical vapor deposition on γ-alumina-coated α-alumina support tubes with outer diameters of 10 mm. Special attention was devoted to obtain high H2/HI selectivity, high H2 permeance, and good stability in the presence of corrosive HI gas. The effects of the deposition conditions, temperature, and period were investigated. The HTMOS membrane prepared at 450 °C for 5 min exhibited high H2/HI selectivity (>175) with H2 permeance on the order of 10−7 mol Pa−1 m−2 s−1. On the basis of stability experiments, it was found that the HTMOS membrane was stable upon HI exposure at a temperature of 400 °C for 11 h.

Original languageEnglish
Pages (from-to)6012-6023
Number of pages12
JournalInternational Journal of Hydrogen Energy
Volume42
Issue number9
DOIs
Publication statusPublished - 2017 Mar 2

    Fingerprint

Keywords

  • Chemical vapor deposition
  • Hydrogen iodide decomposition
  • Silica membrane
  • Thermochemical hydrogen production

ASJC Scopus subject areas

  • Renewable Energy, Sustainability and the Environment
  • Fuel Technology
  • Condensed Matter Physics
  • Energy Engineering and Power Technology

Cite this