Preparation of hydrogen permselective silica membranes by a counter diffusion chemical vapor deposition method

Mikiharu Nomura, Kenta Ono, Suraj Gopalakrishnan, Takashi Sugawara, Hiromitsu Takaba, Shin-ichi Nakao

Research output: Contribution to journalArticle

Original languageEnglish
Pages (from-to)126-129
JournalDefault journal
Publication statusPublished - 2004 Jul 20

Cite this

Nomura, M., Ono, K., Gopalakrishnan, S., Sugawara, T., Takaba, H., & Nakao, S. (2004). Preparation of hydrogen permselective silica membranes by a counter diffusion chemical vapor deposition method. Default journal, 126-129.

Preparation of hydrogen permselective silica membranes by a counter diffusion chemical vapor deposition method. / Nomura, Mikiharu; Ono, Kenta; Gopalakrishnan, Suraj; Sugawara, Takashi; Takaba, Hiromitsu; Nakao, Shin-ichi.

In: Default journal, 20.07.2004, p. 126-129.

Research output: Contribution to journalArticle

Nomura, Mikiharu ; Ono, Kenta ; Gopalakrishnan, Suraj ; Sugawara, Takashi ; Takaba, Hiromitsu ; Nakao, Shin-ichi. / Preparation of hydrogen permselective silica membranes by a counter diffusion chemical vapor deposition method. In: Default journal. 2004 ; pp. 126-129.
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AU - Nakao, Shin-ichi

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