Preparation of thin ferrite films on silicon using RF sputtering

Research output: Contribution to journalArticle

6 Citations (Scopus)

Abstract

Thin-films of Ni xZn 1-x:Fe 2O 4 [(Ni,Zn)-ferrite] are grown by means of RF sputtering on Si(100) and (111) substrates, corresponding to the orientation of Si cantilevers for AFM/MFM measurements. We Find that the ferrite can be sputtered directly onto the Si surfaces, but an additional annealing step is required to obtain a purely polycrystalline, soft magnetic film. The inicrostructure of the films is investigated employing transmission electron microscopy, electron baclcscatter diffraction and magnetic force microscopy.

Original languageEnglish
Pages (from-to)1783-1786
Number of pages4
JournalPhysica Status Solidi (A) Applications and Materials Science
Volume205
Issue number8
DOIs
Publication statusPublished - 2008 Aug 1
Externally publishedYes

Fingerprint

magnetic force microscopy
Silicon
Sputtering
Ferrite
ferrites
sputtering
Magnetic force microscopy
Magnetic films
preparation
magnetic films
silicon
Electron diffraction
electron diffraction
atomic force microscopy
Annealing
Transmission electron microscopy
Thin films
transmission electron microscopy
annealing
Substrates

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Electrical and Electronic Engineering
  • Materials Chemistry

Cite this

Preparation of thin ferrite films on silicon using RF sputtering. / Koblischka, Michael Rudolf; Kirsch, M.; Brust, M.; Koblischka-Veneva, Anjela Dimitrova; Hartmann, U.

In: Physica Status Solidi (A) Applications and Materials Science, Vol. 205, No. 8, 01.08.2008, p. 1783-1786.

Research output: Contribution to journalArticle

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