Properties of Liquid Phase Deposited SiO2 Films for Interlayer Dielectrics in Ultra-large-scale Integrated Circuit Multilevel Interconnections

T.Homma T.Homma; Y.Murao Y.Murao; Tetsuya Homma

Properties of Liquid Phase Deposited SiO2 Films for Interlayer Dielectrics in Ultra-large-scale Integrated Circuit Multilevel Interconnections

T.Homma T.Homma, Y.Murao Y.Murao, Tetsuya Homma

Functional Control Systems

Research output: Contribution to journal › Article › peer-review

Original language	English
Pages (from-to)	15-21
Journal	Thin Solid Films
Volume	249
Publication status	Published - 1994 Sep 1

Cite this

@article{867dd42a1b1e4d5d8fa027a54a9da901,

title = "Properties of Liquid Phase Deposited SiO2 Films for Interlayer Dielectrics in Ultra-large-scale Integrated Circuit Multilevel Interconnections",

author = "T.Homma T.Homma and Y.Murao Y.Murao and Tetsuya Homma",

year = "1994",

month = sep,

day = "1",

language = "English",

volume = "249",

pages = "15--21",

journal = "Thin Solid Films",

issn = "0040-6090",

publisher = "Elsevier",

}