| Original language | English |
|---|---|
| Pages (from-to) | 15-21 |
| Journal | Thin Solid Films |
| Volume | 249 |
| Publication status | Published - 1994 Sep 1 |
Cite this
T.Homma, T. H., Y.Murao, Y. M., & Homma, T. (1994). Properties of Liquid Phase Deposited SiO2 Films for Interlayer Dielectrics in Ultra-large-scale Integrated Circuit Multilevel Interconnections. Thin Solid Films, 249, 15-21.
Properties of Liquid Phase Deposited SiO2 Films for Interlayer Dielectrics in Ultra-large-scale Integrated Circuit Multilevel Interconnections. / T.Homma, T.Homma; Y.Murao, Y.Murao; Homma, Tetsuya.
In: Thin Solid Films, Vol. 249, 01.09.1994, p. 15-21.Research output: Contribution to journal › Article
T.Homma, TH, Y.Murao, YM & Homma, T 1994, 'Properties of Liquid Phase Deposited SiO2 Films for Interlayer Dielectrics in Ultra-large-scale Integrated Circuit Multilevel Interconnections', Thin Solid Films, vol. 249, pp. 15-21.
T.Homma TH, Y.Murao YM, Homma T. Properties of Liquid Phase Deposited SiO2 Films for Interlayer Dielectrics in Ultra-large-scale Integrated Circuit Multilevel Interconnections. Thin Solid Films. 1994 Sep 1;249:15-21.
@article{867dd42a1b1e4d5d8fa027a54a9da901,
title = "Properties of Liquid Phase Deposited SiO2 Films for Interlayer Dielectrics in Ultra-large-scale Integrated Circuit Multilevel Interconnections",
author = "T.Homma T.Homma and Y.Murao Y.Murao and Tetsuya Homma",
year = "1994",
month = "9",
day = "1",
language = "English",
volume = "249",
pages = "15--21",
journal = "Thin Solid Films",
issn = "0040-6090",
publisher = "Elsevier",
}
TY - JOUR
T1 - Properties of Liquid Phase Deposited SiO2 Films for Interlayer Dielectrics in Ultra-large-scale Integrated Circuit Multilevel Interconnections
AU - T.Homma, T.Homma
AU - Y.Murao, Y.Murao
AU - Homma, Tetsuya
PY - 1994/9/1
Y1 - 1994/9/1
M3 - Article
VL - 249
SP - 15
EP - 21
JO - Thin Solid Films
JF - Thin Solid Films
SN - 0040-6090
ER -