Proximity effect in electron-beam-induced deposition

Kazutaka Mitsuishi, Masayuki Shimojo, Masaki Takeguchi, Miyoko Tanaka, Kazuo Furuya

Research output: Contribution to journalArticle

12 Citations (Scopus)

Abstract

We studied the proximity effect in electron-beam-induced deposition (EBID), namely, the frequent deformation of deposited structures as a result of a subsequent deposition performed nearby. Our study showed that this effect largely depends on the conductivity of the substrate used, indicating that electrostatic forces are responsible for the effect. An alternate scan sequence, aimed at reducing charge accumulation during the deposition, was proposed and demonstrated. Using this scan sequence, we were able to fabricate closely separated rods. The electrostatic force responsible for the proximity effect has a scaling feature: the smaller the scale, the stronger the effect of the electrostatic force. For three-dimensional nanostructure fabrications, this feature will enforce another limitation in the size, besides the usual achievable resolution limits imposed by EBID.

Original languageEnglish
Pages (from-to)5517-5521
Number of pages5
JournalJapanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers
Volume45
Issue number6 B
DOIs
Publication statusPublished - 2006 Jun 20
Externally publishedYes

Fingerprint

Electrostatic force
Electron beams
electron beams
electrostatics
nanofabrication
Nanostructures
rods
scaling
Fabrication
conductivity
Substrates

Keywords

  • CVD
  • Electron-beam-induced deposition
  • Nanofabrication

ASJC Scopus subject areas

  • Physics and Astronomy (miscellaneous)

Cite this

Proximity effect in electron-beam-induced deposition. / Mitsuishi, Kazutaka; Shimojo, Masayuki; Takeguchi, Masaki; Tanaka, Miyoko; Furuya, Kazuo.

In: Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers, Vol. 45, No. 6 B, 20.06.2006, p. 5517-5521.

Research output: Contribution to journalArticle

Mitsuishi, Kazutaka ; Shimojo, Masayuki ; Takeguchi, Masaki ; Tanaka, Miyoko ; Furuya, Kazuo. / Proximity effect in electron-beam-induced deposition. In: Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers. 2006 ; Vol. 45, No. 6 B. pp. 5517-5521.
@article{0b0bc58eff084730bda98f56b26bbfc5,
title = "Proximity effect in electron-beam-induced deposition",
abstract = "We studied the proximity effect in electron-beam-induced deposition (EBID), namely, the frequent deformation of deposited structures as a result of a subsequent deposition performed nearby. Our study showed that this effect largely depends on the conductivity of the substrate used, indicating that electrostatic forces are responsible for the effect. An alternate scan sequence, aimed at reducing charge accumulation during the deposition, was proposed and demonstrated. Using this scan sequence, we were able to fabricate closely separated rods. The electrostatic force responsible for the proximity effect has a scaling feature: the smaller the scale, the stronger the effect of the electrostatic force. For three-dimensional nanostructure fabrications, this feature will enforce another limitation in the size, besides the usual achievable resolution limits imposed by EBID.",
keywords = "CVD, Electron-beam-induced deposition, Nanofabrication",
author = "Kazutaka Mitsuishi and Masayuki Shimojo and Masaki Takeguchi and Miyoko Tanaka and Kazuo Furuya",
year = "2006",
month = "6",
day = "20",
doi = "10.1143/JJAP.45.5517",
language = "English",
volume = "45",
pages = "5517--5521",
journal = "Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes",
issn = "0021-4922",
publisher = "Japan Society of Applied Physics",
number = "6 B",

}

TY - JOUR

T1 - Proximity effect in electron-beam-induced deposition

AU - Mitsuishi, Kazutaka

AU - Shimojo, Masayuki

AU - Takeguchi, Masaki

AU - Tanaka, Miyoko

AU - Furuya, Kazuo

PY - 2006/6/20

Y1 - 2006/6/20

N2 - We studied the proximity effect in electron-beam-induced deposition (EBID), namely, the frequent deformation of deposited structures as a result of a subsequent deposition performed nearby. Our study showed that this effect largely depends on the conductivity of the substrate used, indicating that electrostatic forces are responsible for the effect. An alternate scan sequence, aimed at reducing charge accumulation during the deposition, was proposed and demonstrated. Using this scan sequence, we were able to fabricate closely separated rods. The electrostatic force responsible for the proximity effect has a scaling feature: the smaller the scale, the stronger the effect of the electrostatic force. For three-dimensional nanostructure fabrications, this feature will enforce another limitation in the size, besides the usual achievable resolution limits imposed by EBID.

AB - We studied the proximity effect in electron-beam-induced deposition (EBID), namely, the frequent deformation of deposited structures as a result of a subsequent deposition performed nearby. Our study showed that this effect largely depends on the conductivity of the substrate used, indicating that electrostatic forces are responsible for the effect. An alternate scan sequence, aimed at reducing charge accumulation during the deposition, was proposed and demonstrated. Using this scan sequence, we were able to fabricate closely separated rods. The electrostatic force responsible for the proximity effect has a scaling feature: the smaller the scale, the stronger the effect of the electrostatic force. For three-dimensional nanostructure fabrications, this feature will enforce another limitation in the size, besides the usual achievable resolution limits imposed by EBID.

KW - CVD

KW - Electron-beam-induced deposition

KW - Nanofabrication

UR - http://www.scopus.com/inward/record.url?scp=33745647869&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=33745647869&partnerID=8YFLogxK

U2 - 10.1143/JJAP.45.5517

DO - 10.1143/JJAP.45.5517

M3 - Article

VL - 45

SP - 5517

EP - 5521

JO - Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes

JF - Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes

SN - 0021-4922

IS - 6 B

ER -