Proximity effect in electron-beam-induced deposition

Kazutaka Mitsuishi, Masayuki Shimojo, Masaki Takeguchi, Miyoko Tanaka, Kazuo Furuya

Research output: Contribution to journalArticle

12 Citations (Scopus)

Abstract

We studied the proximity effect in electron-beam-induced deposition (EBID), namely, the frequent deformation of deposited structures as a result of a subsequent deposition performed nearby. Our study showed that this effect largely depends on the conductivity of the substrate used, indicating that electrostatic forces are responsible for the effect. An alternate scan sequence, aimed at reducing charge accumulation during the deposition, was proposed and demonstrated. Using this scan sequence, we were able to fabricate closely separated rods. The electrostatic force responsible for the proximity effect has a scaling feature: the smaller the scale, the stronger the effect of the electrostatic force. For three-dimensional nanostructure fabrications, this feature will enforce another limitation in the size, besides the usual achievable resolution limits imposed by EBID.

Original languageEnglish
Pages (from-to)5517-5521
Number of pages5
JournalJapanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers
Volume45
Issue number6 B
DOIs
Publication statusPublished - 2006 Jun 20
Externally publishedYes

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Keywords

  • CVD
  • Electron-beam-induced deposition
  • Nanofabrication

ASJC Scopus subject areas

  • Physics and Astronomy (miscellaneous)

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